公开(公告)号：US20040191931A1

公开(公告)日：2004-09-30

申请号：US10754502

申请日：2004-01-12

Applicant: APPLIED MATERIALS INC.

Inventor： Adrian Murrell ,  Bernard F. Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L021/00

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20020139307A1

公开(公告)日：2002-10-03

申请号：US09820497

申请日：2001-03-28

Applicant: Applied Materials, Inc.

Inventor： Geoffrey Ryding ,  Theodore H. Smick

IPC: C23C016/00

CPC classification number: C23C16/466 ,  C23C14/505 ,  C23C16/4584 ,  H01L21/67109

Abstract: A semiconductor substrate support apparatus comprises a support chuck having at least one chuck manifold extending through the support chuck, and a rotatable shaft coupled to the support chuck. The shaft has at least one shaft conduit disposed therein and extends through the support chuck. A housing circumscribes the shaft and has a housing conduit adapted for connection to a gas source. A plurality of seals are disposed between the shaft and the housing and thereby define a radial passageway between the at least one shaft conduit and the housing conduit for providing a backside gas to a backside of a wafer disposed on the rotating support chuck.

Abstract translation: 半导体衬底支撑装置包括支撑卡盘，其具有延伸穿过支撑卡盘的至少一个卡盘歧管和联接到支撑卡盘的可旋转轴。 轴具有至少一个设置在其中的轴导管，并延伸穿过支撑卡盘。 壳体围绕轴并且具有适于连接到气体源的壳体导管。 多个密封件设置在轴和壳体之间，从而在至少一个轴导管和壳体管道之间限定径向通道，用于将背侧气体提供到设置在旋转支撑卡盘上的晶片的背面。

公开(公告)号：US20040061068A1

公开(公告)日：2004-04-01

申请号：US10259827

申请日：2002-09-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

IPC: H01J027/00

CPC classification number: H01J37/08 ,  H01J1/20 ,  H01J1/26 ,  H01J27/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082

Abstract: An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly Pnullnullnull for subsequent acceleration for high energy implantation.

Abstract translation: 用于离子注入机的离子源的间接加热纽扣阴极具有由安装在轴环件中的塞片形成的纽扣件。 芯块与套环件绝热，使其能够在更高的温度下工作，从而使电子发射增强并集中在芯块的表面上。 lug lug piece piece piece。。。。。。。。。。 替代地，块塞可以是钽以提供较低的热离子功能。 在离子源中产生的浓缩等离子体有效地增强高电荷状态离子的产生，特别是用于高能量注入的后续加速的P +++。

公开(公告)号：US20020088949A1

公开(公告)日：2002-07-11

申请号：US09956247

申请日：2001-09-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Geoffrey Ryding

IPC: G21K005/10

CPC classification number: H01J37/3171 ,  H01J2237/20228

Abstract: A force compensator is provided for a semiconductor processing apparatus having a moving member, in order to compensate for a fixed force on the moving member, such as gravity or atmospheric pressure. A vacuum and piston combination is connected between the movable member and a reaction point. One side of the piston is open to atmosphere and the other side defines an enclosed region which is evacuated. The cylinder is evacuated to a pressure which does not exceed 10% of ambient pressure during operation of the device, so that pressure changes in the low pressure region have minimal effect on the compensation force during movement of the movable member over its displacement range.

Abstract translation: 为具有移动构件的半导体处理装置提供力补偿器，以便补偿诸如重力或大气压力的移动构件上的固定力。 真空和活塞组合连接在可动件和反应点之间。 活塞的一侧对大气开放，另一侧限定了被抽空的封闭区域。 在操作装置的过程中，将气缸排空至不超过环境压力10％的压力，使得低压区域的压力变化对可移动部件在其位移范围内运动期间的补偿力影响最小。