公开(公告)号：US20040191931A1

公开(公告)日：2004-09-30

申请号：US10754502

申请日：2004-01-12

Applicant: APPLIED MATERIALS INC.

Inventor： Adrian Murrell ,  Bernard F. Harrison ,  Peter Ivor Tudor Edwards ,  Peter Kindersley ,  Craig Lowrie ,  Peter Michael Banks ,  Takao Sakase ,  Marvin Farley ,  Shu Satoh ,  Geoffrey Ryding

IPC: H01L021/00

CPC classification number: H01J37/3171 ,  H01J37/3023 ,  H01J49/30 ,  H01J2237/20228 ,  H01J2237/20285 ,  H01J2237/24507 ,  H01J2237/2487 ,  H01J2237/30488 ,  H01J2237/31703 ,  H01J2237/31708 ,  H01L21/67005 ,  H01L21/68714 ,  H01L21/68764

Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.

公开(公告)号：US20040061068A1

公开(公告)日：2004-04-01

申请号：US10259827

申请日：2002-09-30

Applicant: APPLIED MATERIALS, INC.

Inventor： Marvin Farley ,  Takao Sakase ,  Shu Satoh ,  Geoffrey Ryding ,  Peter Rose ,  Christos Christou

IPC: H01J027/00

CPC classification number: H01J37/08 ,  H01J1/20 ,  H01J1/26 ,  H01J27/08 ,  H01J37/3171 ,  H01J2237/061 ,  H01J2237/082

Abstract: An indirectly heated button cathode for use in the ion source of an ion implanter has a button member formed of a slug piece mounted in a collar piece. The slug piece is thermally insulated from the collar piece to enable it to operate at a higher temperature so that electron emission is enhanced and concentrated over the surface of the slug piece. The slug piece and collar piece can be both of tungsten. Instead the slug piece may be of tantalum to provide a lower thermionic work function. The resultant concentrated plasma in the ion source is effective to enhance the production of higher charge state ions, particularly Pnullnullnull for subsequent acceleration for high energy implantation.

Abstract translation: 用于离子注入机的离子源的间接加热纽扣阴极具有由安装在轴环件中的塞片形成的纽扣件。 芯块与套环件绝热，使其能够在更高的温度下工作，从而使电子发射增强并集中在芯块的表面上。 lug lug piece piece piece。。。。。。。。。。 替代地，块塞可以是钽以提供较低的热离子功能。 在离子源中产生的浓缩等离子体有效地增强高电荷状态离子的产生，特别是用于高能量注入的后续加速的P +++。