中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

13 records (took 0.013 seconds)

    Pulse system verification
    2.
    发明授权
    Pulse system verification 有权

    公开(公告)号：US11209478B2

    公开(公告)日：2021-12-28

    申请号：US15944688

    申请日：2018-04-03

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Sathyendra Ghantasala ,  Hyun-Ho Doh

    IPC: G01R31/28 ,  G01R19/00 ,  H04B17/10 ,  H01L21/3065

    Abstract: A system for verifying the operation of RF generators and resulting pulse waveforms in semiconductor processes includes a process chamber, a profile sensor, an optical sensor and a controller. A process implemented by the controller of the system for verifying the operation of RF generators and resulting pulse waveforms in semiconductor processes includes generating a pulse profile of a pulse shape of an RF generator under test, selecting a stored, representative profile of an RF generator known to be operating correctly to compare to the profile generated for the RF generator for a same pulse mode, defining a quantitative metric/control limit to identify similarities and/or differences between pulses of same pulse modes between the generated profile of the RF generator and the stored profile, comparing the generated profile and the selected stored profile, and determining if the RF generator under test is operating properly based on the comparison.

    Methods and apparatuses for plasma chamber matching and fault identification
    4.
    发明授权
    Methods and apparatuses for plasma chamber matching and fault identification 有权

    公开(公告)号：US10607815B2

    公开(公告)日：2020-03-31

    申请号：US16023963

    申请日：2018-06-29

    Applicant: Applied Materials, Inc.

    Inventor： Sathyendra Ghantasala ,  Hyun-Ho Doh ,  Vijayakumar C. Venugopal

    IPC: H01J7/24 ,  H05B31/26 ,  H01J37/32

    Abstract: Methods of operating and assembling a plasma chamber are disclosed. An operating method includes tuning a match network of a plasma chamber while running a non-plasma discharge recipe. A hardware impedance of the plasma chamber is calculated from the match network settings from the tuning. A match loss for the plasma chamber is also calculated according to match network settings. A radio frequency (RF) power setting for the first plasma chamber is set according to the calculated hardware impedance and the calculated match loss. Such methods can be utilized to provide chamber-to-chamber performance matching across different plasma chambers. Certain disclosed methods of operating the plasma chamber can be utilized to identify hardware faults during operation and/or assembly processes.

    Processing chamber hardware fault detection using spectral radio frequency analysis
    8.
    发明授权
    Processing chamber hardware fault detection using spectral radio frequency analysis 有权

    公开(公告)号：US10553397B2

    公开(公告)日：2020-02-04

    申请号：US16365424

    申请日：2019-03-26

    Applicant: Applied Materials, Inc.

    Inventor： Sathyendra K. Ghantasala ,  Vijayakumar C. Venugopal ,  Hyun-Ho Doh

    IPC: H01J37/32 ,  G01R27/04

    Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.

    Processing chamber hardware fault detection using spectral radio frequency analysis
    9.
    发明授权
    Processing chamber hardware fault detection using spectral radio frequency analysis 有权

    公开(公告)号：US10283320B2

    公开(公告)日：2019-05-07

    申请号：US15349139

    申请日：2016-11-11

    Applicant: APPLIED MATERIALS, INC.

    Inventor： Sathyendra K. Ghantasala ,  Vijayakumar C. Venugopal ,  Hyun-Ho Doh

    IPC: G01R27/04 ,  H01J37/32

    Abstract: A method of assigning faults to a processing chamber is described. Some embodiments include applying a radio frequency (RF) signal to a processing chamber to stimulate resonance in the chamber, measuring resonances of the applied RF signal in the chamber, extracting a fingerprint from the measured resonances, comparing the extracted fingerprint to a library of fingerprints, assigning a similarity index to combinations of the extracted fingerprint with at least one fingerprint in the fingerprint library, comparing each similarity index to a threshold, and if the similarity is greater than a threshold, then assigning a fault to the processing chamber using the library fingerprint.

Patent Agency Ranking