公开(公告)号：US10716197B2

公开(公告)日：2020-07-14

申请号：US15708974

申请日：2017-09-19

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Guy Eytan ,  Emil Weisz ,  Samuel Ives Nackash ,  Albert Karabekov

IPC: H05F3/06 ,  G01R29/12 ,  G01R31/305 ,  G01R29/24 ,  G01R31/28 ,  H05F3/04

Abstract: A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.

公开(公告)号：US09817208B1

公开(公告)日：2017-11-14

申请号：US15271093

申请日：2016-09-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Efim Vinnitsky ,  Samuel Ives Nackash ,  Yohanan Madmon

IPC: H01J37/20 ,  H01J37/16 ,  G03F7/00 ,  G02B7/18 ,  G01B11/14 ,  G01B9/02 ,  H01J37/28

CPC classification number: G02B7/181 ,  G01B5/0004 ,  G01B11/026 ,  G01B15/00 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2007

Abstract: A chuck interface that includes a mirror; an inner surface that is shaped and sized to match a portion of a sidewall of a chuck; wherein the inner surface is mechanically coupled to the mirror; and at least one interfacing element for assisting in attaching the chuck to the mirror; and wherein a difference between a thermal expansion coefficient of the chuck and a thermal expansion coefficient of the mirror does not exceed 0.5 micron*Kelvin per Meter.

公开(公告)号：US20210063461A1

公开(公告)日：2021-03-04

申请号：US16560625

申请日：2019-09-04

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yosef Basson ,  Samuel Ives Nackash ,  Ittamar Levy

IPC: G01R31/02 ,  H01J37/244 ,  H01J37/20 ,  G01R31/28

Abstract: A method, a non-transitory computer readable medium and a detection system for detecting an electric arc hazard related to a wafer. The detection system may include a measurement unit, an electrode and a processing unit. The measurement unit may be configured to provide a measurement result by measuring an electrical parameter of the electrode during a test period, while the wafer may be moved in relation to the electrode, and while a certain electrical field may be formed between the electrode and the wafer; wherein the certain electrical field induces detached ends of partially detached conductive elements of the wafer to move away from the wafer. The processing unit may be configured to determine an existence of the electric arc hazard based on the measurement result.

公开(公告)号：US20190090335A1

公开(公告)日：2019-03-21

申请号：US15708974

申请日：2017-09-19

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Guy Eytan ,  Emil Weisz ,  Samuel Ives Nackash ,  Albert Karabekov

IPC: H05F3/06 ,  G01R29/12

Abstract: A computer program product and a method for dissipation of an electrical charge stored in a region of an object. The method may include (a) sensing, by at least one sensor, an electrical charging status of the region of the object, while the object is located within a vacuum chamber and while a gaseous pressure within the vacuum chamber is below a certain vacuum pressure threshold; and (b) performing, based on the charging status of the given region, an electrical charge dissipation process that comprises increasing the gaseous pressure within the vacuum chamber to be within a given gaseous pressure range that facilitates a dissipation, by breakdown, of the electrical charge stored in the region of the object to the vacuum chamber.

公开(公告)号：US11293993B2

公开(公告)日：2022-04-05

申请号：US16560625

申请日：2019-09-04

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Yosef Basson ,  Samuel Ives Nackash ,  Ittamar Levy

IPC: G01R31/28 ,  H01J37/244 ,  H01J37/20 ,  G01R31/50 ,  H01J37/26

Abstract: A method, a non-transitory computer readable medium and a detection system for detecting an electric arc hazard related to a wafer. The detection system may include a measurement unit, an electrode and a processing unit. The measurement unit may be configured to provide a measurement result by measuring an electrical parameter of the electrode during a test period, while the wafer may be moved in relation to the electrode, and while a certain electrical field may be formed between the electrode and the wafer; wherein the certain electrical field induces detached ends of partially detached conductive elements of the wafer to move away from the wafer. The processing unit may be configured to determine an existence of the electric arc hazard based on the measurement result.

公开(公告)号：US09805906B1

公开(公告)日：2017-10-31

申请号：US15271100

申请日：2016-09-20

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Efim Vinnitsky ,  Samuel Ives Nackash ,  Shmuel Barak Mizrahi ,  Natan Schlimoff

IPC: H01J37/147 ,  H01J37/20 ,  G03F1/00 ,  H01J37/28

CPC classification number: H01J37/28 ,  G01B11/002 ,  G01B11/028 ,  H01J37/20 ,  H01J2237/20285 ,  H01J2237/20292

Abstract: A mirror support module having a body that includes an internal portion surrounding an inner space, an external portion, an aperture formed in the body and an intermediate region that extends between a segment of the internal portion and the aperture. When the intermediate region is subjected to a force directed in a first direction, the intermediate region can be moved in the first direction towards the aperture to reduce an area of the aperture while the external portion remains stable regardless of movement of the intermediate region.