公开(公告)号：US20170097571A1

公开(公告)日：2017-04-06

申请号：US15286260

申请日：2016-10-05

Applicant: ASELTA NANOGRAPHICS

Inventor： Luc MARTIN ,  Thomas QUAGLIO ,  Matthieu MILLEQUANT ,  Clyde BROWNING ,  Serdar MANAKLI

IPC: G03F7/20

CPC classification number: G03F1/78 ,  G03F7/70383 ,  G03F7/70433 ,  G03F7/70441 ,  G03F7/70491 ,  G03F7/705 ,  H01J37/3026 ,  H01J37/3174 ,  H01J37/3178 ,  H01J2237/3175

Abstract: A method for transferring a fractured pattern decomposed into elementary shapes, onto a substrate by direct writing by a particle or photon beam, comprises a step of identifying at least one elementary shape of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance envelope; a step of removing the removable shape or shapes from the fractured pattern to obtain a modified fractured pattern; and an exposure step, comprising exposing the substrate to a plurality of shots of a shaped particle or photon beam, each shot corresponding to an elementary shape of the modified fractured pattern. A computer program product for carrying out such a method is provided.