公开(公告)号：US10197909B2

公开(公告)日：2019-02-05

申请号：US15286260

申请日：2016-10-05

Applicant: ASELTA NANOGRAPHICS

Inventor： Luc Martin ,  Thomas Quaglio ,  Matthieu Millequant ,  Clyde Browning ,  Serdar Manakli

IPC: G03B27/42 ,  G03F1/78 ,  G03F7/20 ,  H01J37/302 ,  H01J37/317

Abstract: A method for transferring a fractured pattern decomposed into elementary shapes, onto a substrate by direct writing by a particle or photon beam, comprises a step of identifying at least one elementary shape of the fractured pattern, called removable elementary shape, whose removal induces modifications of the transferred pattern within a preset tolerance envelope; a step of removing the removable shape or shapes from the fractured pattern to obtain a modified fractured pattern; and an exposure step, comprising exposing the substrate to a plurality of shots of a shaped particle or photon beam, each shot corresponding to an elementary shape of the modified fractured pattern. A computer program product for carrying out such a method is provided.