公开(公告)号：US20230352332A1

公开(公告)日：2023-11-02

申请号：US18138776

申请日：2023-04-25

Applicant: ASM IP Holding B.V.

Inventor： Shubham Garg ,  Jaeyong Cho ,  Amit Mishra ,  Akshay Phadnis

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H05B3/283

Abstract: An electrostatic chuck (ESC) pedestal heater that includes a pedestal body and a surface on the pedestal body for receiving a substrate such as a high bow wafer. An electrode is embedded in the pedestal body to selectively generate an electrostatic force. The ESC pedestal heater includes a substrate contact surface that is raised to a height above the surface on the pedestal body and includes an inner seal band, an intermediate seal band, and an outer seal band extending. In the substrate contact surface, main spokes are provided that extend outward from the inner seal band to the outer seal band, and ancillary spokes may be provided between the main spokes in the region between the intermediate and outer seal bands. Additionally, contact areas or dots are provided in the substrate contact surface in the spaces between the bands and spokes.