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公开(公告)号：US12255053B2
公开(公告)日：2025-03-18
申请号：US17544167
申请日：2021-12-07
Applicant: ASM IP Holding B.V.
Inventor： Daniele Piumi , Pamela Rene Fischer
IPC: C23C16/458 , C23C16/44 , C23C16/455 , C23C16/46 , C23C16/509 , C23C16/52 , H01J37/32
Abstract: Plasma-assisted methods for depositing materials and related systems are described. The methods described herein comprise ending a deposition process when a plasma characteristic matches a pre-determined criterion.
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