Patent search ap:("ASM IP Holding B.V.") AND inv:"Renè Henricus Jozef Vervuurt" Page 1

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发明申请
STRUCTURES FOR PATTERNING AND RELATED METHODS AND SYSTEMS 有权

公开(公告)号：US20240419068A1

公开(公告)日：2024-12-19

申请号：US18740139

申请日：2024-06-11

Applicant: ASM IP Holding B.V.

Inventor： Daniele Piumi , David Kurt de Roest , Joäo Antunes Afonso , Steaphan Mark Wallace , Yoann Tomczak , Renè Henricus Jozef Vervuurt

IPC: G03F7/00 , G03F7/004 , G03F7/11 , G03F7/16

Abstract: Structures and related systems and methods for dose reduction in extreme ultraviolet (EUV) lithography. The structures can comprise a dose reducing layer, an adhesion layer, and a resist.

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