公开(公告)号：US12124172B2

公开(公告)日：2024-10-22

申请号：US17634702

申请日：2020-08-05

Applicant: ASML Holding N.V.

Inventor： Alexander Kremer

IPC: G03F7/20 ,  G01J3/02 ,  G01J3/44 ,  G03F7/00

CPC classification number: G03F7/70558 ,  G01J3/021 ,  G01J3/0291 ,  G01J3/4406 ,  G03F7/7085

Abstract: The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (540), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors (550) configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (545), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.