公开(公告)号：US20200341366A1

公开(公告)日：2020-10-29

申请号：US16765339

申请日：2018-11-27

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V

Inventor： Derk Servatius Gertruda BROUNS ,  Joshua ADAMS ,  Aage BENDIKSEN ,  Richard JACOBS ,  Andrew JUDGE ,  Veera Venkata Narasimha Narendra Phani KOTTAPALLI ,  Joseph Harry LYONS ,  Theodorus Marinus MODDERMAN ,  Manish RANJAN ,  Marcus Adrianus VAN DE KERKHOF ,  Xugang XIONG

IPC: G03F1/64 ,  G03F1/00 ,  G03F7/20

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US20230142459A1

公开(公告)日：2023-05-11

申请号：US17918426

申请日：2021-04-08

Applicant: ASML Holding N.V.

Inventor： Andrew JUDGE ,  Ravi Chaitanya KALLURI ,  Michal Emanuel PAWLOWSKI ,  James Hamilton WALSH ,  Justin Lloyd KREUZER

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01N21/47

CPC classification number: G03F1/84 ,  G01N21/94 ,  G01N21/4795 ,  G01N21/8806 ,  G01N21/8851 ,  G03F7/2004 ,  G01N2021/8896

Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.

公开(公告)号：US20220075277A1

公开(公告)日：2022-03-10

申请号：US17418478

申请日：2019-12-12

Applicant: ASML Holding N.V.

Inventor： Jeffrey John LOMBARDO ,  Ronald Peter ALBRIGHT ,  Daniel Leslie HALL ,  Victor Antonio PEREZ-FALCON ,  Andrew JUDGE

IPC: G03F7/20

Abstract: Methods and systems are described for reducing particulate contaminants on a clamping face of a clamping structure in a lithographic system. A substrate such as a cleaning reticle is pressed against the clamping face. A temperature differential is established between the substrate and the clamping face either before or after clamping occurs to facilitate transfer of particles from the clamping face to the substrate.

公开(公告)号：US20240103386A1

公开(公告)日：2024-03-28

申请号：US18376237

申请日：2023-10-03

Applicant: ASML NETHERLANDS B.V ,  ASML HOLDING N.V

Inventor： Derk Servatius Gertruda BROUNS ,  Joshua ADAMS ,  Aage BENDIKSEN ,  Richard JACOBS ,  Andrew JUDGE ,  Veera Venkata Narasimha Narendra Phani KOTTAPALLI ,  Joseph Harry LYONS ,  Theodorus Marinus MODDERMAN ,  Manish RANJAN ,  Marcus Adrianus VAN DE KERKHOF ,  Xugang XIONG

IPC: G03F7/00 ,  G03F1/62 ,  G03F1/64

CPC classification number: G03F7/7085 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70983

Abstract: An apparatus for determining a condition associated with a pellicle for use in a lithographic apparatus, the apparatus including a sensor, wherein the sensor is configured to measure a property associated with the pellicle, the property being indicative of the pellicle condition.

公开(公告)号：US20200166855A1

公开(公告)日：2020-05-28

申请号：US16630508

申请日：2018-06-28

Applicant: ASML HOLDING N.V

Inventor： Andrew JUDGE ,  Aage BENDIKSEN ,  Pedro Julian RIZO DIAGO

IPC: G03F7/20

Abstract: A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed to control the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination.