公开(公告)号：US20230142459A1

公开(公告)日：2023-05-11

申请号：US17918426

申请日：2021-04-08

Applicant: ASML Holding N.V.

Inventor： Andrew JUDGE ,  Ravi Chaitanya KALLURI ,  Michal Emanuel PAWLOWSKI ,  James Hamilton WALSH ,  Justin Lloyd KREUZER

IPC: G03F1/84 ,  G01N21/88 ,  G01N21/94 ,  G03F7/20 ,  G01N21/47

CPC classification number: G03F1/84 ,  G01N21/94 ,  G01N21/4795 ,  G01N21/8806 ,  G01N21/8851 ,  G03F7/2004 ,  G01N2021/8896

Abstract: An inspection system (1600), a lithography apparatus, and an inspection method are provided. The inspection system (1600) includes an illumination system (1602), a detection system (1606), and processing circuitry (1622). The illumination system generates a first illumination beam (1610) at a first wavelength and a second illumination beam (1618) at a second wavelength. The first wavelength is different from the second wavelength. The illumination system irradiates an object (1612) simultaneously with the first illumination beam and the second illumination beam. The detection system receives radiation (1620) scattered by a particle (1624) present at a surface (1626) of the object at the first wavelength. The detection system generates a detection signal. The processing circuitry determines a characteristic of the particle based on the detection signal.