公开(公告)号：US20040239911A1

公开(公告)日：2004-12-02

申请号：US10449663

申请日：2003-06-02

Applicant: ASML Holding N.V.

Inventor： Frederick M. Carter ,  Daniel N. Galburt ,  Stephen Roux

IPC: G03B027/62

CPC classification number: G03F7/70066 ,  G03F7/70758 ,  G03F7/70816 ,  G03F7/70825 ,  H02K41/03 ,  H02K2201/18

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US20040239283A1

公开(公告)日：2004-12-02

申请号：US10449001

申请日：2003-06-02

Applicant: ASML Holding N.V.

Inventor： Daniel N. Galburt ,  Frederick M. Carter ,  Stephen Roux

IPC: G05B011/32

CPC classification number: G03F7/70066

Abstract: A method, apparatus, and system for controlling a reticle-masking blade in a photolithography system. A reticle-masking blade is supported with a reticle-masking blade carriage assembly. The reticle-masking blade carriage assembly is levitated at a position with respect to a reference frame and at an orientation with respect to the reference frame. Preferably, the reticle-masking blade carriage assembly is electromagnetically levitated. At least one of the position and the orientation of the reticle-masking blade carriage assembly is measured. At least one of the position and the orientation of the reticle-masking blade carriage assembly is controlled. Optionally, the reticle-masking blade carriage assembly is moved within a dimension within a range defined by the reference frame. The dimension can be two dimensions. The movement of the reticle-masking blade carriage assembly can be controlled.

Abstract translation: 一种用于在光刻系统中控制掩模掩模刀片的方法，装置和系统。 掩模版掩模刀片由掩模版掩模刀片托架组件支撑。 掩模版掩模刀片托架组件相对于参考框架在相对于参考框架的取向处悬浮。 优选地，掩模掩模刮板滑架组件是电磁悬浮的。 测量掩模版掩模片滑架组件的位置和取向中的至少一个。 掩模版掩模刀片支架组件的位置和取向中的至少一个被控制。 可选地，掩模版掩模刮板滑架组件在由参考框限定的范围内的尺寸内移动。 尺寸可以是两个维度。 可以控制掩模掩模刮板托架组件的运动。

公开(公告)号：US20040207273A1

公开(公告)日：2004-10-21

申请号：US10680290

申请日：2003-10-08

Applicant: ASML Holding, N.V.

Inventor： Daniel N. Galburt

IPC: H02K009/00

CPC classification number: G03F7/70858 ,  G03F7/70758 ,  H02K9/19 ,  H02K9/22 ,  H02K41/02

Abstract: An actuator coil with a race track winding that generates a magnetic field. A cooling tube has cooling liquid flowing therethrough and is wrapped around a periphery of said race track winding. A plurality of thermal conductive strips are arranged generally transverse to at least portions of said race track winding so as to conduct heat from said racetrack winding to said cooling tube.

Abstract translation: 具有产生磁场的赛道绕组的致动器线圈。 冷却管具有流过其中的冷却液，并且缠绕在所述赛道绕组的周围。 多个导热条通常横向于所述跑道绕组的至少一部分布置，以便将热量从所述跑道线圈传导到所述冷却管。

公开(公告)号：US20040207830A1

公开(公告)日：2004-10-21

申请号：US10842513

申请日：2004-05-11

Applicant: ASML Holding, N.V.

Inventor： Daniel N. Galburt

IPC: G03B027/58

CPC classification number: G03F7/70758 ,  G03F7/70833 ,  G03F7/709

Abstract: A method, system, and apparatus for management of reaction loads in a lithography system is described. An isolated structure is supported by a non-isolated structure. The isolated structure supports a moveable stage. A linear motor includes a first linear motor element and a second linear motor element. The first linear motor element is coupled to the moveable stage. A plurality of parallel flexure plates mount the second linear motor element on the isolated structure. A flexure rod is coupled between the non-isolated structure and the second linear motor element.

Abstract translation: 描述了用于管理光刻系统中的反应负载的方法，系统和装置。 隔离结构由非隔离结构支持。 隔离结构支持可移动阶段。 线性马达包括第一线性马达元件和第二线性马达元件。 第一线性马达元件联接到可移动台。 多个平行弯曲板将第二线性马达元件安装在隔离结构上。 挠性杆联接在非隔离结构和第二线性电动机元件之间。