公开(公告)号：US20040239901A1

公开(公告)日：2004-12-02

申请号：US10447197

申请日：2003-05-29

Applicant: ASML Holding N.V.

Inventor： Solomon Wasserman ,  Jason D. Hintersteiner ,  Wenceslao A. Cebuhar ,  Gerald T. Volpe

IPC: G03B027/42

CPC classification number: G03F7/70283 ,  G03F7/70291

Abstract: A maskless lithography system and method produces gray scale patterns on objects. The system includes an illumination source (e.g., either pulsed or effectively continuous), an object including an array of exposure areas, an array of spatial light modulators (e.g., either digital, binary, or analog), and a controller. The array of spatial light modulators pattern and direct light from the illumination source to the object. Each of the spatial light modulators have active areas that respectively correspond with one of the exposure areas on the object. The controller controls the array of spatial light modulators, such that the pattern of the light has spatially varying intensities.

Abstract translation: 无掩模光刻系统和方法在物体上产生灰度图案。 该系统包括照明源（例如，脉冲或有效连续的），包括曝光区域阵列的物体，空间光调制器阵列（例如数字，二进制或模拟）和控制器。 空间光调制器的阵列将照明源的图案和直接光线对准物体。 每个空间光调制器具有分别对应于物体上的曝光区域之一的有效区域。 控制器控制空间光调制器的阵列，使得光的图案具有空间变化的强度。