公开(公告)号：US20040179270A1

公开(公告)日：2004-09-16

申请号：US10808436

申请日：2004-03-25

Applicant: ASML Holding N.V.

Inventor： Scott Coston ,  Wenceslao A. Cebuhar ,  Jason D. Hintersteiner

IPC: B41J027/00 ,  G02B027/10

CPC classification number: G03F7/70158 ,  B41J2/451 ,  G02B27/0905 ,  G03F7/70083 ,  G03F7/70183 ,  G03F7/70291

Abstract: An illumination method and system use a light source and illumination optics to illuminate a pattern generator. The illumination optics can include at least two devices. For example, if first and second diffractive and/or refractive devices are used, one can be a pupil defining element (PDE) and one can be a field defining element (FDE). In another example, a third diffractive or refractive element can be used to make light entering the illumination system uniform. When only two are used, the PDE forms one or more light beams having a defined profile. The FDE directs the one or more light beams having the defined profile, such that each directed beam substantially corresponds in size and shape to a desired illumination area(s) on the pattern generator. The directed beams are directed to impinge substantially only on the desired illumination area(s). Thus, using the PDE and the FDE increases optical efficiency of light impinging on the pattern generator and substantially reduces or eliminates stray light caused by light impinging on undesired areas of the pattern generator.

Abstract translation: 照明方法和系统使用光源和照明光学器件来照亮图案发生器。 照明光学器件可以包括至少两个装置。 例如，如果使用第一和第二衍射和/或折射装置，则可以是瞳孔限定元件（PDE），并且可以是场限定元件（FDE）。 在另一示例中，可以使用第三衍射或折射元件来使进入照明系统的光均匀。 当仅使用两个时，PDE形成一个或多个具有确定的轮廓的光束。 FDE引导具有限定轮廓的一个或多个光束，使得每个定向光束在尺寸和形状上基本对应于图案发生器上的期望的照明区域。 定向光束被引导以基本上仅在期望的照明区域上照射。 因此，使用PDE和FDE提高了照射在图案发生器上的光的光学效率，并且基本上减少或消除了光照射在图案发生器的不需要的区域上的杂散光。

公开(公告)号：US20040239907A1

公开(公告)日：2004-12-02

申请号：US10447214

申请日：2003-05-29

Applicant: ASML Holding N.V.

Inventor： Jason D. Hintersteiner ,  Karel van der Mast ,  Arno Bleeker

IPC: G03B027/54 ,  G02F001/00 ,  G02B026/00

CPC classification number: G03F7/70041 ,  G03F7/70558

Abstract: A system and method are used for pulse to pulse dose control in an illumination system, used, for example, in a lithography or a maskless lithography machine. The system and method can be used to decrease effective laser pulse-to-pulse variability in lithographic lasers, allowing adequate dose control using a minimum number of pulses (e.g. as little as one pulse).

Abstract translation: 系统和方法被用于例如在光刻或无掩模光刻机中使用的照明系统中的脉冲到脉冲剂量控制。 该系统和方法可以用于降低光刻激光器中有效的激光脉冲到脉冲变化，从而允许使用最小数目的脉冲（例如少至一个脉冲）进行充分的剂量控制。

公开(公告)号：US20040239908A1

公开(公告)日：2004-12-02

申请号：US10449908

申请日：2003-05-30

Applicant: ASML Holding N.V.

Inventor： Arno Bleeker ,  Wenceslao A. Cebuhar ,  Jason D. Hintersteiner ,  Andrew W. McCullough ,  Solomon Wasserman

IPC: G03B027/54

CPC classification number: G03F7/70466 ,  G03F7/70283 ,  G03F7/70291 ,  G03F7/70358 ,  G03F7/70558

Abstract: A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.

Abstract translation: 在对象上写入图案的无掩模光刻系统。 该系统可以包括照明系统，物体，空间光调制器（SLM）和控制器。 在对象接收到光之前，SLM可以对来自照明系统的光进行图案化。 SLM可以包括一个前导集合和一组尾随SLM。 前导和后置集合中的SLM根据对象的扫描方向而改变。 控制器可以基于光脉冲周期信息，关于SLM的物理布局信息和对象的扫描速度中的至少一个来向SLM发送控制信号。 该系统还可以使用各种方法校正剂量不均匀性。

公开(公告)号：US20040239901A1

公开(公告)日：2004-12-02

申请号：US10447197

申请日：2003-05-29

Applicant: ASML Holding N.V.

Inventor： Solomon Wasserman ,  Jason D. Hintersteiner ,  Wenceslao A. Cebuhar ,  Gerald T. Volpe

IPC: G03B027/42

CPC classification number: G03F7/70283 ,  G03F7/70291

Abstract: A maskless lithography system and method produces gray scale patterns on objects. The system includes an illumination source (e.g., either pulsed or effectively continuous), an object including an array of exposure areas, an array of spatial light modulators (e.g., either digital, binary, or analog), and a controller. The array of spatial light modulators pattern and direct light from the illumination source to the object. Each of the spatial light modulators have active areas that respectively correspond with one of the exposure areas on the object. The controller controls the array of spatial light modulators, such that the pattern of the light has spatially varying intensities.

Abstract translation: 无掩模光刻系统和方法在物体上产生灰度图案。 该系统包括照明源（例如，脉冲或有效连续的），包括曝光区域阵列的物体，空间光调制器阵列（例如数字，二进制或模拟）和控制器。 空间光调制器的阵列将照明源的图案和直接光线对准物体。 每个空间光调制器具有分别对应于物体上的曝光区域之一的有效区域。 控制器控制空间光调制器的阵列，使得光的图案具有空间变化的强度。