公开(公告)号：US20220299892A1

公开(公告)日：2022-09-22

申请号：US17631082

申请日：2020-07-22

Applicant: ASML Holding N.V.

Inventor： Muhsin ERALP

IPC: G03F9/00 ,  G03F7/20

Abstract: An alignment method includes directing an illumination beam with a varying wavelength or frequency towards an alignment target, collecting diffraction beams from the alignment target and directing towards an interferometer. The alignment method also includes producing, by the interferometer, two diffraction sub-beams from the diffraction beams, wherein the diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment method further includes measuring interference intensity of the diffraction beams based on a temporal phase shift, wherein the temporal phase shift is a function of the varying wavelength or frequency of the illumination beam and a fixed optical path difference between the diffraction beams. The alignment method also includes determining a position of the alignment target from the measured interference intensity.

公开(公告)号：US20240027913A1

公开(公告)日：2024-01-25

申请号：US18255261

申请日：2021-12-02

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Sergei SOKOLOV ,  Simon Reinald HUISMAN ,  Jin LIAN ,  Sebastianus Adrianus GOORDEN ,  Muhsin ERALP ,  Henricus Petrus Maria PELLEMANS ,  Justin Lloyd KREUZER

IPC: G03F7/00

CPC classification number: G03F7/70091 ,  G03F7/70625 ,  G03F7/70633

Abstract: A metrology system (400) includes a multi-source radiation system. The multi-source radiation system includes a waveguide device (502) and the multi-source radiation system is configured to generate one or more beams of radiation. The metrology system (400) further includes a coherence adjuster (500) including a multimode waveguide device (504). The multimode waveguide device (504) includes an input configured to receive the one or more beams of radiation from the multi-source radiation system (514) and an output (518) configured to output a coherence adjusted beam of radiation for irradiating a target (418). The metrology system (400) further includes an actuator (506) coupled to the waveguide device (502) and configured to actuate the waveguide device (502) so as to change an impingement characteristic of the one or more beams of radiation at the input of the multimode waveguide device (504).

公开(公告)号：US20240077308A1

公开(公告)日：2024-03-07

申请号：US18260817

申请日：2022-01-04

Applicant: ASML Holding N.V.

Inventor： Mohamed SWILLAM ,  Justin Lloyd KREUZER ,  Stephen ROUX ,  Michael Leo NELSON ,  Muhsin ERALP

IPC: G01B11/27 ,  G03F7/20

CPC classification number: G01B11/272 ,  G03F7/20

Abstract: A metrology system includes a radiation source, an adjustable diffractive element, an optical system, an optical element, and a processor. The radiation source generates radiation. The adjustable diffractive element diffracts the radiation to generate first and second beams of radiation. The first and second beams have first and second different non-zero diffraction orders, respectively. The optical system directs the first and second beams toward a target structure such that first and second scattered beams of radiation are generated based on the first and second beams, respectively. The metrology system adjusts a phase difference of the first and second scattered beams. The optical element interferes the first and second scattered beams at an imaging detector that generates a detection signal. The processor receives and analyzes the detection signal to determine a property of the target structure based on the adjusted phase difference.

公开(公告)号：US20220397833A1

公开(公告)日：2022-12-15

申请号：US17633884

申请日：2020-08-05

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Franciscus Godefridus Casper BIJNEN ,  Muhsin ERALP ,  Simon Reinald HUISMAN ,  Arie Jeffrey DEN BOEF

IPC: G03F9/00

Abstract: An alignment apparatus includes an illumination system configured to direct one or more illumination beams towards an alignment target and receive the diffracted beams from the alignment target. The alignment apparatus also includes a self-referencing Interferometer configured to generate two diffraction sub-beams, wherein the two diffraction sub-beams are orthogonally polarized, rotated 180 degrees with respect to each other around an alignment axis, and spatially overlapped. The alignment apparatus further includes a beam analyzer configured to generate interference between the overlapped components of the diffraction sub-beams and produce two orthogonally polarized optical branches, and a detection system configured to determine a position of the alignment target based on light intensity measurement of the optical branches, wherein the measured light intensity is temporally modulated by a phase modulator.