公开(公告)号：US20240319608A1

公开(公告)日：2024-09-26

申请号：US18262467

申请日：2022-01-16

Applicant: ASML Holding N.V.

Inventor： Roberto B. WIENER ,  Kalyan Kumar MANKALA ,  Todd R. DOWNEY

IPC: G03F7/00

CPC classification number: G03F7/70141 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/7015 ,  G03F7/70191 ,  G03F7/7085

Abstract: Systems, apparatuses, and methods are provided for adjusting illumination slit uniformity in a lithographic apparatus. An example method can include irradiating, by a radiation source, a portion of a finger assembly with radiation. The example method can further include receiving, by a radiation detector, at least a portion of the radiation in response to the irradiating of the portion of the finger assembly. The example method can further include determining, by a processor, a change in a shape of the finger assembly based on the received radiation. The example method can further include generating, by the processor, a control signal configured to modify a position of the finger assembly based on the determined change in the shape of the finger assembly. Subsequently, the example method can include transmitting, by the processor, the control signal to a motion control system coupled to the finger assembly.

公开(公告)号：US20230055116A1

公开(公告)日：2023-02-23

申请号：US17794905

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Peter Conrad KOCHERSPERGER ,  Christopher Michael DOHAN ,  Justin Lloyd KREUZER ,  Michal Emanuel PAWLOWSKI ,  Aage BENDIKSEN ,  Kirill Urievich SOBOLEV ,  James Hamilton WALSH ,  Roberto B. WIENER ,  Arun Mahadevan VENKATARAMAN

IPC: G03F1/84

Abstract: An inspection system includes a radiation source that generates a beam of radiation and irradiates a first surface of an object, defining a region of the first surface of the object. The radiation source also irradiates a second surface of the object, defining a region of the second surface, wherein the second surface is at a different depth level within the object than the first surface. The inspection system may also include a detector that defines a field of view (FOV) of the first surface including the region of the first surface, and receives radiation scattered from the region of the first surface and the region of the second surface. The inspection system may also include a processor that discards image data not received from the region of the first surface, and constructs a composite image comprising the image data from across the region of the first surface.

公开(公告)号：US20230089666A1

公开(公告)日：2023-03-23

申请号：US17797421

申请日：2021-01-21

Applicant: ASML Holding N.V.

Inventor： Christopher Michael DOHAN ,  James Hamilton WALSH ,  Roberto B. WIENER

IPC: G01N21/956 ,  G03F7/20

Abstract: A pattering device inspection apparatus, system and method are described. According to one aspect, an inspection method is disclosed, the method including receiving, at a multi-element detector within an inspection system, radiation scattered at a surface of an object. The method further includes measuring, with processing circuitry, an output of each element of the multi-element detector, the output corresponding to the received scattered radiation. Moreover, the method includes calibrating, with the processing circuitry, the multi-element detector by identifying an active pixel area comprising one or more elements of the multi-element detector with a measured output being above a predetermined threshold. The method also includes identifying an inactive pixel area comprising a remainder of elements of the multi-element detector. Additionally, the method includes setting the active pixel area as a default alignment setting between the multi-element detector and a light source causing the scattered radiation.

公开(公告)号：US20230075162A1

公开(公告)日：2023-03-09

申请号：US17799652

申请日：2021-01-26

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Roberto B. WIENER ,  Peter Conrad KOCHERSPERGER ,  Boris KOGAN ,  Martinus Agnes Willem CUIJPERS ,  Robert Jeffrey WADE ,  Shaun EVANS

IPC: G03F7/20 ,  H01L21/687

Abstract: Embodiments herein describe methods, devices, and systems for a reticle gripper damper and isolation system for handling reticles and reducing vibrations in a reticle handler for lithography apparatuses and systems. A reticle handler apparatus includes a reticle handler arm, a reticle baseplate configured to hold the reticle, and a gripper arranged to connect the reticle baseplate to the reticle handler arm. The gripper includes a static structure that is coupled to the reticle handler arm, an isolation structure that is coupled to the static structure, and one or more damping elements. The gripper is configured to reduce vibrations of the reticle in the reticle handler apparatus using the one or more damping elements.