CHARGED-PARTICLE BEAM APPARATUS FOR VOLTAGE-CONTRAST INSPECTION AND METHODS THEREOF

    公开(公告)号:US20250027990A1

    公开(公告)日:2025-01-23

    申请号:US18713108

    申请日:2022-10-26

    Abstract: Systems and methods of inspecting a sample using a charged-particle beam apparatus with enhanced probe current and high current density of the primary charged-particle beam are disclosed. The apparatus includes a charged-particle source, a first condenser lens configured to condense the primary charged-particle beam and operable in a first mode and a second mode, wherein: in the first mode, the first condenser lens is configured to condense the primary charged-particle beam, and in the second mode, the first condenser lens is configured to condense the primary charged-particle beam sufficiently to form a crossover along the primary optical axis. The apparatus further includes a second condenser lens configured to adjust a first beam current of the primary charged-particle beam in the first mode and adjust a second beam current of the primary charged-particle beam in the second mode, the second beam current being larger than the first beam current.

    DETECTION OF BURIED FEATURES BY BACKSCATTERED PARTICLES

    公开(公告)号:US20200243299A1

    公开(公告)日:2020-07-30

    申请号:US16649975

    申请日:2018-09-21

    Abstract: Disclosed herein an apparatus and a method for detecting buried features using backscattered particles. In an example, the apparatus comprises a source of charged particles; a stage; optics configured to direct a beam of the charged particles to a sample supported on the stage; a signal detector configured to detect backscattered particles of the charged particles in the beam from the sample; wherein the signal detector has angular resolution. In an example, the methods comprises obtaining an image of backscattered particles from a region of a sample; determining existence or location of a buried feature based on the image.

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