公开(公告)号：US20220113637A1

公开(公告)日：2022-04-14

申请号：US17510524

申请日：2021-10-26

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  H01J37/22 ,  G01B15/00 ,  H01J37/28 ,  H01L21/66

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：US11720030B2

公开(公告)日：2023-08-08

申请号：US17510524

申请日：2021-10-26

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01B15/00 ,  H01J37/222 ,  H01J37/28 ,  H01L22/12 ,  H01J2237/2817

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：US11175590B2

公开(公告)日：2021-11-16

申请号：US16755127

申请日：2018-10-05

Applicant: ASML Netherlands B.V.

Inventor： Fei Wang ,  Wei Fang ,  Kuo-Shih Liu

IPC: G03F7/20 ,  G01B15/00 ,  H01J37/22 ,  H01J37/28 ,  H01L21/66

Abstract: Systems and methods for conducting critical dimension metrology are disclosed. According to certain embodiments, a charged particle beam apparatus generates a beam for imaging a first area and a second area. Measurements are acquired corresponding to a first feature in the first area, and measurements are acquired corresponding to a second feature in the second area. The first area and the second area are at separate locations on a sample. A combined measurement is calculated based on the measurements of the first feature and the measurements of the second feature.

公开(公告)号：US11043356B2

公开(公告)日：2021-06-22

申请号：US16700552

申请日：2019-12-02

Applicant: ASML Netherlands B.V.

Inventor： Wei Fang ,  Kevin Liu ,  Fei Wang ,  Jack Jau ,  Zhaohui Guo

IPC: H01J37/20 ,  H01J37/06 ,  H01J37/22 ,  H01J37/30 ,  H01J37/304

Abstract: A calibration method for calibrating the position error in the point of interest induced from the stage of the defect inspection tool is achieved by controlling the deflectors directly. The position error in the point of interest is obtained from the design layout database.