公开(公告)号：US10987705B2

公开(公告)日：2021-04-27

申请号：US16841547

申请日：2020-04-06

Applicant: ASML Netherlands B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: B08B7/04 ,  H01J37/02 ,  H01J37/317 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US11738376B2

公开(公告)日：2023-08-29

申请号：US17238124

申请日：2021-04-22

Applicant: ASML Netherlands B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: B08B7/04 ,  H01J37/02 ,  H01J37/317 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

CPC classification number: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/1472 ,  H01J37/18 ,  H01J37/3177 ,  H01J2237/006 ,  H01J2237/022 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/0492

Abstract: A charged particle beam system is disclosed, comprising:



a charged particle beam generator for generating a beam of charged particles;
a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles;
a source for providing a cleaning agent;
a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element;




wherein the charged particle optical element comprises:



a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and
at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element,




wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.
Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US12202019B2

公开(公告)日：2025-01-21

申请号：US18360731

申请日：2023-07-27

Applicant: ASML Netherlands B.V.

Inventor： Marc Smits ,  Johan Joost Koning ,  Chris Franciscus Jessica Lodewijk ,  Hindrik Willem Mook ,  Ludovic Lattard

IPC: B08B7/04 ,  B08B17/02 ,  H01J37/02 ,  H01J37/147 ,  H01J37/18 ,  H01J37/317

Abstract: A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.