公开(公告)号：US20210350507A1

公开(公告)日：2021-11-11

申请号：US17308835

申请日：2021-05-05

Applicant: ASML Netherlands B.V.

Inventor： Wei FANG ,  Ruochong FEI ,  Lingling PU ,  Wentian ZHOU ,  Liangjiang YU ,  Bo WANG

IPC: G06T5/00 ,  G06T5/50 ,  G06T7/10

Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a first image and a second image of multiple stacked layers of a sample that are taken with a first focal point and a second focal point, respectively, associating a first segment of the first image with a first layer among the multiple stacked layers and associating a second segment of the second image with a second layer among the multiple stacked layers, updating the first segment based on a first reference image corresponding to the first layer and updating the second segment based on a second reference image corresponding to the second layer, and combining the updated first segment and the updated second segment to generate a combined image including the first layer and the second layer.

公开(公告)号：US20220068590A1

公开(公告)日：2022-03-03

申请号：US17418741

申请日：2019-12-19

Applicant: ASML Netherlands B.V.

Inventor： Ying LUO ,  Zhonghua DONG ,  Xuehui YIN ,  Long DI ,  Nianpei DENG ,  Wei FANG ,  Lingling PU ,  Ruochong FEI ,  Bohang ZHU ,  Yu LIU

IPC: H01J37/147 ,  H01J37/20 ,  H01J37/21 ,  H01J37/28

Abstract: Systems and methods for irradiating a sample with a charged-particle beam are disclosed. The charged-particle beam system may comprise a stage configured to hold a sample and is movable in at least one of X-Y-Z axes. The charged-particle beam system may further comprise a position sensing system to determine a lateral and vertical displacement of the stage, and a beam deflection controller configured to apply a first signal to deflect a primary charged-particle beam incident on the sample to at least partly compensate for the lateral displacement, and to apply a second signal to adjust a focus of the deflected charged-particle beam incident on the sample to at least partly compensate for the vertical displacement of the stage. The first and second signals may comprise an electrical signal having a high bandwidth in a range of 10 kHz to 50 kHz, and 50 kHz to 200 kHz, respectively.