Translation generation for a mask pattern
    1.
    发明申请
    Translation generation for a mask pattern 失效
    掩模图案的翻译生成

    公开(公告)号:US20060190911A1

    公开(公告)日:2006-08-24

    申请号:US11035928

    申请日:2005-01-14

    Applicant: Alan Stivers

    Inventor: Alan Stivers

    CPC classification number: G03F1/24 B82Y10/00 B82Y40/00 G03F1/72

    Abstract: Generation of one or more translations is described. The generated translations may be applied to a mask pattern so that the pattern may be moved to cover one or more mask defects in part or in totality.

    Abstract translation: 描述一个或多个翻译的生成。 产生的平移可以应用于掩模图案,使得图案可以被移动以部分地或全部地覆盖一个或多个掩模缺陷。

    Method and apparatus for producing electromagnetic radiation
    2.
    发明申请
    Method and apparatus for producing electromagnetic radiation 有权
    用于产生电磁辐射的方法和装置

    公开(公告)号:US20060066197A1

    公开(公告)日:2006-03-30

    申请号:US10956194

    申请日:2004-09-30

    Applicant: Alan Stivers

    Inventor: Alan Stivers

    CPC classification number: H05G2/003 H05G2/005

    Abstract: According to one aspect of the invention, a method and apparatus for producing electromagnetic radiation is provided. The apparatus may include a chamber wall enclosing a plasma emission chamber to contain a plasma emission gas. A first electrode may be within the plasma emission chamber. At least one second electrode may within the plasma emission chamber. The at least one second electrode may be rotatable about an axis thereof and positioned within the plasma emission chamber such that when a voltage is applied across the first electrode and the at least one second electrode, a plasma is generated between the first electrode and the at least one second electrode.

    Abstract translation: 根据本发明的一个方面,提供了一种用于产生电磁辐射的方法和装置。 该装置可以包括封闭等离子体发射室以容纳等离子体发射气体的室壁。 第一电极可以在等离子体发射室内。 至少一个第二电极可以在等离子体发射室内。 至少一个第二电极可以围绕其轴线旋转并且定位在等离子体发射室内,使得当跨越第一电极和至少一个第二电极施加电压时,在第一电极和第二电极之间产生等离子体 至少一个第二电极。

    Method of repairing an opaque defect on a mask with electron beam-induced chemical etching
    4.
    发明授权
    Method of repairing an opaque defect on a mask with electron beam-induced chemical etching 失效
    用电子束诱导的化学蚀刻修复掩模上的不透明缺陷的方法

    公开(公告)号:US06897157B2

    公开(公告)日:2005-05-24

    申请号:US10659961

    申请日:2003-09-10

    Abstract: The present invention discloses a method of fabricating and repairing a mask without damage and an apparatus including a holder to mount a substrate; a stage to position the holder in a chamber; a pumping system to evacuate the chamber; an imaging system to locate an opaque defect in the substrate; a gas delivery system to dispense a reactant gas towards the defect; and an electron delivery system to direct electrons towards the opaque defect.

    Abstract translation: 本发明公开了一种无损伤地制造和修复掩模的方法,以及包括用于安装基板的保持器的装置; 将保持器定位在室中的阶段; 泵送系统,以抽空室; 成像系统,用于定位衬底中的不透明缺陷; 用于将反应气体分配给缺陷的气体输送系统; 以及将电子引向不透明缺陷的电子传递系统。

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