公开(公告)号：US08888916B2

公开(公告)日：2014-11-18

申请号：US14088013

申请日：2013-11-22

Applicant: Applied Materials, Inc.

Inventor： Ming-Kuei (Michael) Tseng ,  Norman L. Tam ,  Yoshitaka Yokota ,  Agus S. Tjandra ,  Robert Navasca ,  Mehran Behdjat ,  Sundar Ramamurthy ,  Kedarnath Sangam ,  Alexander N. Lerner

IPC: C23C16/00 ,  H01L21/00 ,  H01L21/67 ,  F27D7/06

CPC classification number: H01L21/67115 ,  F27D7/06 ,  H01L21/67017 ,  H01L21/67098

Abstract: Embodiments of the present invention provide apparatus and method for improving gas distribution during thermal processing. One embodiment of the present invention provides an apparatus for processing a substrate comprising a chamber body defining a processing volume, a substrate support disposed in the processing volume, wherein the substrate support is configured to support and rotate the substrate, a gas inlet assembly coupled to an inlet of the chamber body and configured to provide a first gas flow to the processing volume, and an exhaust assembly coupled to an outlet of the chamber body, wherein the gas inlet assembly and the exhaust assembly are disposed on opposite sides of the chamber body, and the exhaust assembly defines an exhaust volume configured to extend the processing volume.

Abstract translation: 本发明的实施例提供了用于改善热处理期间气体分布的装置和方法。 本发明的一个实施例提供了一种用于处理衬底的装置，其包括限定处理体积的室主体，设置在处理容积中的衬底支撑件，其中衬底支撑件构造成支撑和旋转衬底;气体入口组件， 室主体的入口并且被配置为向处理容积提供第一气流，以及联接到室主体的出口的排气组件，其中气体入口组件和排气组件设置在室主体的相对侧上 ，并且排气组件限定了被配置为延长处理量的排气量。

公开(公告)号：US08698049B2

公开(公告)日：2014-04-15

申请号：US13657935

申请日：2012-10-23

Applicant: Applied Materials, Inc.

Inventor： Joseph M. Ranish ,  Khurshed Sorabji ,  Kedarnath Sangam ,  Alexander Lerner

IPC: A21B1/00 ,  F21V29/00

CPC classification number: F27B17/0025 ,  F27D5/0037 ,  F27D21/0014 ,  H01L21/67109 ,  H01L21/67115

Abstract: Embodiments of a lamphead and apparatus utilizing same are provided. In some embodiments, a lamphead for thermal processing may include a monolithic member having a plurality of coolant passages and a plurality of lamp passages and reflector cavities, wherein each lamp passage is configured to accommodate a lamp and each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for the lamp, and wherein the plurality of coolant passages are disposed proximate to the plurality of lamp passages; and at least one heat transfer member extending from the monolithic member into each coolant passage, wherein the at least one heat transfer member extends into each coolant passage up to the full height of each coolant passage. The lamphead may be disposed in an apparatus comprising a process chamber having a substrate support, wherein the lamphead is positioned to provide energy to the substrate support.

Abstract translation: 提供了一种灯头和利用其的装置的实施例。 在一些实施例中，用于热处理的灯头可以包括具有多个冷却剂通道和多个灯通道和反射器腔的整体构件，其中每个灯通道被配置为容纳灯，并且每个反射器腔被成形为充当 反射器或接收用于灯的可替换反射器，并且其中所述多个冷却剂通道设置成靠近所述多个灯通道; 以及至少一个传热构件，其从所述整体构件延伸到每个冷却剂通道中，其中所述至少一个传热构件延伸到每个冷却剂通道中直到每个冷却剂通道的全高度。 灯头可以设置在包括具有基板支撑件的处理室的设备中，其中灯头被定位成向基板支撑件提供能量。

公开(公告)号：US09423042B2

公开(公告)日：2016-08-23

申请号：US13764204

申请日：2013-02-11

Applicant: APPLIED MATERIALS, INC.

Inventor： Chandrasekhar Balasubramanyam ,  Helder Lee ,  Miriam Schwartz ,  Elizabeth Wu ,  Kedarnath Sangam

IPC: F16K15/14 ,  C23C16/44 ,  C23C16/455 ,  F16K51/02 ,  H01L21/677

CPC classification number: F16K15/147 ,  C23C16/4401 ,  C23C16/45519 ,  F16K51/02 ,  H01L21/67772

Abstract: Methods and apparatus for increasing flow uniformity are provided herein. In some embodiments, a slit valve having increased flow uniformity may be provided, the slit valve may include a housing having an opening disposed therethrough, the opening configured to allow a substrate to pass therethrough; a gas inlet formed in the housing; an outer plenum disposed in the housing and coupled to the gas inlet; an inner plenum disposed in the housing and coupled to the outer plenum via a plurality of holes; and a plurality of gas outlets disposed in the housing and fluidly coupling the opening to the inner plenum.