公开(公告)号：US20250079116A1

公开(公告)日：2025-03-06

申请号：US18239988

申请日：2023-08-30

Applicant: Applied Materials, Inc.

Inventor： Michael Mason Carrell ,  Aaron P. Webb ,  Jason M. Schaller ,  William H. Park, JR. ,  David Blahnik ,  Wai-Ming Tam

IPC: H01J37/20 ,  C23C14/48 ,  H01J37/317

Abstract: An apparatus that may be used to allow the rotation of a component that passes through a wall of a vacuum chamber is disclosed. The apparatus includes a rotatable shaft through which the component passes. The rotatable shaft is held in place using a holder, which retains a portion of the rotatable shaft. In some embodiments, the holder is affixed to a plate, which is then affixed to the chamber wall. The plate has an opening which is aligned to the opening in the chamber wall. A portion of the rotatable shaft passes through the opening in the plate and vacuum seals are disposed between the rotatable shaft and the plate. This apparatus may be used to allow use of rotatable components in an ion implanter.

公开(公告)号：US20240153733A1

公开(公告)日：2024-05-09

申请号：US17981188

申请日：2022-11-04

Applicant: Applied Materials, Inc.

Inventor： Michael Mason Carrell ,  Jason M. Schaller ,  Victor Flores Iracheta

IPC: H01J37/20 ,  C23C14/48 ,  C23C14/56 ,  H01J37/317 ,  H01L21/67

CPC classification number: H01J37/20 ,  C23C14/48 ,  C23C14/566 ,  H01J37/3171 ,  H01L21/67201 ,  H01J2237/201 ,  H01J2237/204

Abstract: An ion implantation system including an ion source for generating an ion beam, an end station containing a platen for supporting a substrate to be implanted by the ion beam, and a load lock disposed adjacent the end station and adapted to transfer substrates between an external environment and the end station. The load lock may include a transfer chamber having a hollow interior, a first isolation door affixed to a first side of the transfer chamber and openable to the external environment, a second isolation door affixed to a second side of the transfer chamber and openable to an interior of the end station, and a volume filling cassette disposed within the hollow interior of the transfer chamber and adapted to hold at least one substrate.