公开(公告)号：US10672642B2

公开(公告)日：2020-06-02

申请号：US16049037

申请日：2018-07-30

Applicant: Applied Materials, Inc.

Inventor： Paneendra Prakash Bhat ,  Mehmet Samir ,  Nikolai Kalnin

IPC: H01L21/687 ,  G01C9/02 ,  H01L21/67 ,  H01J37/32

Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.

公开(公告)号：US20250022694A1

公开(公告)日：2025-01-16

申请号：US18762865

申请日：2024-07-03

Applicant: Applied Materials, Inc.

Inventor： Pranav Vijay Gadre ,  Adib M. Khan ,  Qiwei Liang ,  Dmitry Lubomirsky ,  Hyun Joo Lee ,  Paneendra Prakash Bhat ,  Douglas A. Buchberger, JR. ,  Onkara Swamy Korasiddaramaiah ,  Vijay D. Parkhe ,  Junghoon Kim ,  Kallol Bera ,  Rupali Sahu ,  Sathya Swaroop Ganta

IPC: H01J37/32 ,  C23C16/44 ,  C23C16/455 ,  C23C16/458 ,  C23C16/46 ,  C23C16/509 ,  H05B6/54 ,  H05B6/62

Abstract: A substrate support assembly includes a heater plate including a dielectric material, a heater electrode embedded within the heater plate, a set of distributed purge channels formed within the heater plate, wherein the set of distributed purge channels provides a set of gas flow paths to equalize a gas flow from within the heater plate and direct the gas flow in a direction below the heater plate, a ground electrode embedded within the heater plate, and a radio frequency (RF) mesh embedded within the plate.

公开(公告)号：US20240234108A1

公开(公告)日：2024-07-11

申请号：US18403982

申请日：2024-01-04

Applicant: Applied Materials, Inc.

Inventor： Paneendra Prakash Bhat ,  Qiwei Liang ,  Douglas Buchberger ,  Dmitry Lubomirsky ,  Naveen Kumar Nagaraja ,  Vijay D. Parkhe

IPC: H01J37/32 ,  G03F7/00 ,  G03F7/38 ,  H01L21/683

CPC classification number: H01J37/32724 ,  G03F7/38 ,  G03F7/70708 ,  H01J37/32642 ,  H01L21/6833 ,  H01J2237/002 ,  H01J2237/2007

Abstract: Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The electrostatic chuck body may define a backside gas lumen that extends through a surface of the substrate seat. The assemblies may include a bias electrode coupled with the electrostatic chuck body. The bias electrode may include a plurality of conductive mesas that protrude upward across the substrate seat. The assemblies may include a support stem coupled with the electrostatic chuck body. The assemblies may include at least one chucking electrode embedded within the electrostatic chuck body. The assemblies may include at least one heater embedded within the electrostatic chuck body.

公开(公告)号：US20200035540A1

公开(公告)日：2020-01-30

申请号：US16049037

申请日：2018-07-30

Applicant: Applied Materials, Inc.

Inventor： Paneendra Prakash Bhat ,  Mehmet Samir ,  Nikolai Kalnin

IPC: H01L21/687 ,  G01C9/02 ,  H01L21/67

Abstract: Exemplary apparatuses for centering and/or leveling a pedestal of a processing chamber may include a mounting block having a central axis, a set of first gauges mounted on the mounting block, and a set of second gauges mounted on the mounting block. The set of second gauges may be mounted substantially perpendicular to the set of first gauges. The plurality of first gauges may be configured to obtain measurements indicative of a degree of parallelism between a gas distribution plate of the processing chamber and the pedestal. The plurality of second gauges may be configured to obtain measurements indicative of a degree of axial alignment of a ring member of the processing chamber and the pedestal. The exemplary apparatuses may be used for centering and/or leveling the pedestal under vacuum.