Abstract:
The present invention discloses a conductive film including a substrate, a first hard coated layer, a second hard coated layer, a first refraction layer, a second refraction layer, and a transparent conductive layer, which are arranged in a predetermined order. The second hard coated layer has the silicon-based material accounting for certain percentages of the weight thereof, and the transparent conductive layer may cover parts of the second refraction layer. When a light enters into the transparent conductive layer/the second refraction layer with an incident angle, the light may be associated with a first reflectance/a second reflectance. The difference between the first reflectance and the second reflectance is designed to be lower than a first threshold value. Accordingly, the present invention may eliminate the display difference between an etched and a non-etched area of the conductive film and improve the visual quality.
Abstract:
A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes two transparent conductive films stacked on top of each other and a plurality of embedded conductive circuits formed between the two transparent conductive films and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface on the top side thereof for an external object to touch.
Abstract:
A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of embedded conductive circuits embedded into the first coating layer and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger, any type of touch pen, or etc.) to touch.
Abstract:
The present invention discloses a conductive film including a substrate, a reflective index adjusting structure, and a transparent conductive layer. The reflective index adjusting structure may be disposed on the substrate, and the transparent conductive layer may be disposed on the reflective index adjusting structure, which may be disposed between the transparent conductive layer and the substrate. The transparent conductive layer may cover parts of the reflective index adjusting structure. When a light enters into the transparent conductive layer/the reflective index adjusting structure of the conductive film with an incident angle, the light may be associated with a first reflectance/a second reflectance. The difference between the first reflectance and the second reflectance is designed to be lower than a first threshold value. Accordingly, the present invention may eliminate the display difference between an etched and a non-etched area of the conductive film and improve the visual quality.
Abstract:
A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of embedded conductive circuits embedded therein and arranged to form a predetermined embedded circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer to cover the embedded conductive circuits. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger or touch pen) to touch.
Abstract:
A transparent conductive structure applied to a touch panel includes a substrate unit, a first coating unit, a transparent conductive unit, and a second coating unit. The substrate unit includes a transparent substrate. The first coating unit includes a first coating layer formed on the top surface of the transparent substrate. The transparent conductive unit includes a transparent conductive layer formed on the top surface of the first coating layer. The transparent conductive layer includes a plurality of conductive circuits arranged to form a predetermined circuit pattern. The second coating unit includes a second coating layer formed on the top surface of the transparent conductive layer to cover the conductive circuits. The second coating layer has a touching surface formed on the top side thereof, and the touching surface allows an external object (such as user's finger, any type of touch pen, or etc.) to touch.
Abstract:
A transparent conductive structure includes a substrate unit and a conductive unit. The substrate unit includes at least one plastic substrate. The conductive unit includes at least one transparent conductive film and at least one nanometer conductive group formed at the same time, wherein the transparent conductive film is formed on the plastic substrate, and the nanometer conductive group includes a plurality of conductive nanowire filaments mixed or embedded in the transparent conductive film. In other words, both the transparent conductive film and the nanometer conductive group in the instant disclosure can be respectively formed by two different forming methods (such as sputtering and vaporing) at the same time, and the conductive nanowire filaments of the nanometer conductive group can be formed inside the transparent conductive film.
Abstract:
A manufacturing method of a composite poly-silicon substrate of solar cells includes the following steps: providing a first substrate layer having a purity ranging from 2N to 3N; and forming a second substrate layer on the first substrate layer, where the purity of the second substrate layer ranges from 6N to 9N.
Abstract:
A composite poly-silicon substrate for solar cell having a first substrate layer and a second substrate layer is disclosed. The purity of the first substrate layer ranges from 2N to 3N. The second substrate layer is formed on the first substrate layer, and the purity of the second substrate layer ranges from 6N to 9N.
Abstract:
The present invention discloses a conductive film including a substrate, a hard coated layer, a first refraction layer, a second refraction layer, and a transparent conductive layer. The hard coated layer may be disposed on the substrate with the silicon-based material accounting for certain percentages of the weight thereof. Placement of the first refraction layer, the second refraction layer, and the transparent conductive layer may be arranged in a predetermined order. The transparent conductive layer may cover parts of the second refraction layer. When a light enters into the transparent conductive layer and the second refraction layer with an incident angle, the light may be associated with a first reflectance and a second reflectance, respectively. The difference between the first reflectance and the second reflectance may be lower than a first threshold value for eliminating the display difference between an etched and a non-etched area of the conductive film.