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公开(公告)号：US10384810B2
公开(公告)日：2019-08-20
申请号：US14800436
申请日：2015-07-15
Applicant: California Institute of Technology
Inventor： Cecile Jung-Kubiak , Colleen M. Marrese-Reading , Victor E. White , Daniel W. Wilson , Matthew R. Dickie , Karl Y. Yee , Richard E. Muller , James E. Polk , John R. Anderson , Nima Rouhi , Frank Greer
IPC: B64G1/40
Abstract: Micro-emitter arrays and methods of microfabricating such emitter arrays are provided. The microfabricated emitter arrays incorporate a plurality of emitters with heights greater than 280 microns with uniformity of +/−10 microns arranged on a supporting silicon substrate, each emitter comprising an elongated body extending from the top surface of the substrate and incorporating at least one emitter tip on the distal end of the elongated body thereof. The emitters may be disposed on the substrate in an ordered array in an X by Y grid pattern, wherein X and Y can be any number greater than zero. The micro-emitter arrays may utilize a LMIS propellant source including, for example, gallium, indium, bismuth, or tin. The substrate may incorporate at least one through-via providing a fluid pathway for the LMIS propellant to flow from a propellant reservoir beneath the substrate to the top substrate surface whereupon the micro-emitter array is disposed.
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公开(公告)号：US12237137B2
公开(公告)日：2025-02-25
申请号：US17221170
申请日：2021-04-02
Applicant: California Institute of Technology
Inventor： Pedro P. Guerrero Vela , James E. Polk
Abstract: Aspects include a method for treating a polycrystalline material, the method comprising: exposing a surface of the polycrystalline material to a plasma thereby changing the surface of the polycrystalline material from being characterized by a starting condition to being characterized by a treated condition; wherein: the surface comprises a plurality of crystallites each having the composition MB6, M being a metal element; the plasma comprises ions, the ions being characterized by an average ion flux selected from the range of 1.5 to 100 A/cm2 and an average ion energy that is less than a sputtering threshold energy; the starting condition of the surface is characterized by a first average work function and the treated condition of the surface is characterized by a second average work function; and the second average work function is less than the first average work function.
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公开(公告)号：US20180201395A1
公开(公告)日：2018-07-19
申请号：US14800436
申请日：2015-07-15
Applicant: California Institute of Technology
Inventor： Cecile Jung-Kubiak , Colleen M. Marrese-Reading , Victor E. White , Daniel W. Wilson , Matthew R. Dickie , Karl Y. Yee , Richard E. Muller , James E. Polk , John R. Anderson , Nima Rouhi , Frank Greer
IPC: B64G1/40
CPC classification number: B64G1/405
Abstract: Micro-emitter arrays and methods of microfabricating such emitter arrays are provided. The microfabricated emitter arrays incorporate a plurality of emitters with heights greater than 280 microns with uniformity of +/−10 microns arranged on a supporting silicon substrate, each emitter comprising an elongated body extending from the top surface of the substrate and incorporating at least one emitter tip on the distal end of the elongated body thereof. The emitters may be disposed on the substrate in an ordered array in an X by Y grid pattern, wherein X and Y can be any number greater than zero. The micro-emitter arrays may utilize a LMIS propellant source including, for example, gallium, indium, bismuth, or tin. The substrate may incorporate at least one through-via providing a fluid pathway for the LMIS propellant to flow from a propellant reservoir beneath the substrate to the top substrate surface whereupon the micro-emitter array is disposed.
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