公开(公告)号：US20100177190A1

公开(公告)日：2010-07-15

申请号：US12726933

申请日：2010-03-18

Applicant: Ann-Shyn CHIANG ,  Hsiu-Ming Chang ,  Chia-He Chen ,  Chien-Chung Fu ,  Chang-Huain Hsieh

Inventor： Ann-Shyn CHIANG ,  Hsiu-Ming Chang ,  Chia-He Chen ,  Chien-Chung Fu ,  Chang-Huain Hsieh

IPC: H04N7/18 ,  G02B21/26 ,  G02B21/36

CPC classification number: G02B21/26 ,  G02B21/006

Abstract: A microscopy system includes an image focusing module, a stage for supporting a sample, image collection unit for collecting sliced images of the sample acquired by the image focusing module, and an image fusion unit for fusing sliced images of the sample acquired from different observation angles. The stage supports the sample and is configured to be revolvable around a rotational axis which is substantially perpendicular to an extending direction from the sample to the image focusing module so that enabling the image focusing module to acquire sliced images of the sample from different observation angles. The image fusion unit is used for remapping the sliced images acquired from different observation angles into a reference coordinate system, converting anisotropic voxels resolution of the sliced images to isotropic resolution, and fusing the sliced images into a final image.

Abstract translation: 显微镜系统包括图像聚焦模块，用于支撑样本的台，用于收集由图像聚焦模块获取的样本的切片图像的图像收集单元和用于对从不同观察角度获取的样本的切片图像进行融合的图像融合单元 。 舞台支撑样本，并被构造成围绕基本上垂直于从样本到图像聚焦模块的延伸方向的旋转轴线旋转，使得能够使图像聚焦模块能够从不同的观察角度获取样本的切片图像。 图像融合单元用于将从不同观察角度获取的切片图像重新映射到参考坐标系中，将切片图像的各向异性体素分辨率转换为各向同性分辨率，并将切片图像融合成最终图像。

公开(公告)号：US20070275521A1

公开(公告)日：2007-11-29

申请号：US11798884

申请日：2007-05-17

Applicant: Chien-Chung Fu

Inventor： Chien-Chung Fu

IPC: H01L21/8234 ,  H01L21/336

CPC classification number: B29C35/0894 ,  A61M37/0015 ,  A61M2037/0053 ,  B29C2035/0827 ,  B81B2201/055 ,  B81C1/00111

Abstract: A method of manufacturing a hollow micro-needle structure includes the steps of: disposing a first mask layer and a second mask layer respectively aside a first substrate and aside a rear surface of the first substrate, wherein the first substrate is transparent to predetermined light; forming a photoresist layer on the front surface of the first substrate and the first mask layer; providing the predetermined light to illuminate the first substrate in a direction from the rear surface to the front surface so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form the micro-needle structure, which is formed by the exposed portion. The micro-needle structure has an inclined sidewall and a through hole surrounded by the inclined sidewall.

Abstract translation: 一种中空微针结构体的制造方法，其特征在于，包括：将第一掩模层和第二掩模层分别配置在第一基板的外侧，将第一基板的背面放置在第一基板的背面， 在所述第一基板和所述第一掩模层的前表面上形成光致抗蚀剂层; 提供所述预定光以在从所述后表面到所述前表面的方向上照亮所述第一基板，以暴露所述光致抗蚀剂层以形成暴露部分和未曝光部分; 并且去除未曝光部分以形成由暴露部分形成的微针结构。 微针结构具有倾斜侧壁和由倾斜侧壁包围的通孔。

公开(公告)号：US08400616B2

公开(公告)日：2013-03-19

申请号：US12839716

申请日：2010-07-20

Applicant: Chien-Chung Fu

Inventor： Chien-Chung Fu

IPC: G03B27/54 ,  G02B27/00 ,  G03B27/58

CPC classification number: G03B27/58 ,  G03F7/70408

Abstract: A laser interference lithography apparatus capable of stitching small exposed areas into a large exposed area includes a body, a laser beam supplying unit, a reflecting mechanism, an L-shaped fixing mechanism and a substrate stage. The laser beam supplying unit fixed onto the body provides a laser beam. The reflecting mechanism is movably and rotatably mounted on the body. The L-shaped fixing mechanism mounted on the body includes a first mounting seat and a second mounting seat. An upright first reflecting mirror is fixed to the first mounting seat. The second mounting seat connected to the first mounting seat fixes a horizontal mask, and is substantially perpendicular to the first mounting seat. The substrate stage, movably mounted on the body and disposed below the second mounting seat, supports a substrate. Thus, a large-area pattern formed by stitching small-area patterns may be obtained.

Abstract translation: 能够将小曝光区域拼接成大的露出区域的激光干涉光刻设备包括主体，激光束供给单元，反射机构，L形固定机构和基板台。 固定在主体上的激光束供给单元提供激光束。 反射机构可移动和可旋转地安装在主体上。 安装在本体上的L形固定机构包括第一安装座和第二安装座。 直立的第一反射镜固定到第一安装座。 连接到第一安装座的第二安装座固定水平掩模，并且基本上垂直于第一安装座。 衬底台可移动地安装在主体上并且设置在第二安装座下方，支撑衬底。 因此，可以获得通过拼接小面积图案形成的大面积图案。

公开(公告)号：US07538025B2

公开(公告)日：2009-05-26

申请号：US10714304

申请日：2003-11-14

Applicant: Chao-Cheng Chen ,  Chen-Nan Yeh ,  Chien-Chung Fu

Inventor： Chao-Cheng Chen ,  Chen-Nan Yeh ,  Chien-Chung Fu

IPC: H01L21/4763

CPC classification number: H01L21/76808 ,  H01L21/02126 ,  H01L21/02203 ,  H01L21/31695

Abstract: A method of forming a dual damascene opening comprising the following steps. A structure having an overlying exposed conductive layer formed thereover is provided. A dielectric layer is formed over the exposed conductive layer. An anti-reflective coating layer is formed over the dielectric layer. The anti-reflective layer and the dielectric layer are etched using a via opening process to form an initial via exposing a portion of the conductive layer. A protective film portion is formed over at least the exposed portion of the conductive layer. The anti-reflective coating layer and the dielectric layer are patterned to reduce the initial via to a reduced via and to form a trench opening substantially centered over the reduced via. The trench opening and the reduced via comprising the dual damascene opening.

Abstract translation: 一种形成双镶嵌开口的方法，包括以下步骤。 提供一种其上形成有上覆的暴露的导电层的结构。 在暴露的导电层上形成电介质层。 在电介质层上形成抗反射涂层。 使用通孔打开工艺蚀刻抗反射层和电介质层，以形成暴露导电层的一部分的初始通孔。 至少在导电层的暴露部分上形成保护膜部分。 将抗反射涂层和电介质层图案化以将初始通孔减小到减小的通孔，并形成基本上位于经过还原通孔的中心的沟槽开口。 沟槽开口和通孔包括双镶嵌开口。

公开(公告)号：US07436009B2

公开(公告)日：2008-10-14

申请号：US11732883

申请日：2007-04-04

Applicant: Yi-Chen Huang ,  Chien-Chung Fu ,  Ming-Hong Hsieh ,  Hui Ouyang ,  Yi-Nien Su ,  Hun-Jan Tao

Inventor： Yi-Chen Huang ,  Chien-Chung Fu ,  Ming-Hong Hsieh ,  Hui Ouyang ,  Yi-Nien Su ,  Hun-Jan Tao

IPC: H01L29/06

CPC classification number: H01L21/76865 ,  H01L21/76808 ,  H01L21/76843 ,  H01L21/76846 ,  H01L21/76862

Abstract: Via hole and trench structures and fabrication methods are disclosed. The structure includes a conductive layer in a dielectric layer, and a via structure in the dielectric layer contacting a portion of a surface of the conductive layer. The via structure includes the conductive liner contacting the portion of the surface of the first conductive layer. A trench structure is formed on the via structure in the dielectric without the conductive liner layer in the trench.

Abstract translation: 公开了通孔和沟槽结构和制造方法。 该结构包括电介质层中的导电层，以及介电层中与导电层表面的一部分接触的通孔结构。 通孔结构包括与第一导电层的表面的部分接触的导电衬垫。 在电介质中的通孔结构上形成沟槽结构，而沟槽中没有导电衬垫层。

公开(公告)号：US06289746B1

公开(公告)日：2001-09-18

申请号：US09235162

申请日：1999-01-22

Applicant: Chien-Chung Fu ,  Cheng-Kuo Lee ,  Ching-Yi Wu

Inventor： Chien-Chung Fu ,  Cheng-Kuo Lee ,  Ching-Yi Wu

IPC: G01F1708

CPC classification number: G01F1/7084

Abstract: A thermal pulsed micro flow sensor includes thermal sensors positioned in a fluid channel at downstream positions relative to a heater. Flow rate is measured by determining the time that it takes a thermal pulse to pass between two of the sensors. Since the resolution of the measurement increases with increasing distance between sensors while the accuracy of the measurement decreases, there is a conflict between the requirements of accuracy and short response time, as well as between accuracy and resolution. By providing at least three sensors and by varying the distances between the sensors, however, it is possible to select a pair of sensors having the highest resolution required by the application in which the sensor is used, while still ensuring that the velocity measurement is within the range of velocities accurately measurable by the selected sensors. Furthermore, for sensors having predetermined overlapping velocity measurement ranges, by selecting the distance between two sensors based on a desired accuracy, and by including an adjustment factor, a desired resolution can likewise be achieved. As a result, the cross-sectional area of the channel can be made constant, and the micro flow sensing device can be can be used for different flow conditions without having to adjust the sensors, or to use sensors having different characteristics.

Abstract translation: 热脉冲微流量传感器包括位于相对于加热器的下游位置的流体通道中的热传感器。 通过确定热脉冲在两个传感器之间通过的时间来测量流速。 由于测量的分辨率随着传感器之间的距离增加而增加，而测量的精度降低，精度要求和响应时间短以及精度和分辨率之间存在冲突。 然而，通过提供至少三个传感器并且通过改变传感器之间的距离，可以选择一个具有使用传感器的应用所需的最高分辨率的传感器，同时仍然确保速度测量在 所选传感器精确测量的速度范围。 此外，对于具有预定重叠速度测量范围的传感器，通过基于期望的精度选择两个传感器之间的距离，并且通过包括调整因子，同样可以实现期望的分辨率。 结果，可以使通道的横截面积恒定，并且微流量检测装置可以用于不同的流动状态，而不必调整传感器，或者使用具有不同特性的传感器。

公开(公告)号：US20140010645A1

公开(公告)日：2014-01-09

申请号：US13541886

申请日：2012-07-05

Applicant: Li-Jia Huang ,  Chien-Chung Fu ,  Yen-Min Su

Inventor： Li-Jia Huang ,  Chien-Chung Fu ,  Yen-Min Su

IPC: F04D29/05

CPC classification number: F04D25/062 ,  F04D29/083

Abstract: A fan structure includes a cap, a fixing shaft, a bearing, an impeller and a protection lid, wherein the cap comprises a bottom portion, a body and an accommodating space. The fixing shaft is disposed within the accommodating space, a first end portion of the fixing shaft couples the bottom portion, and a second end portion of the fixing shaft protrudes to the body. The bearing couples to the fixing shaft, the second end portion of the fixing shaft protrudes to the bearing, and a hub of the impeller couples to the bearing. The second end portion of the fixing shaft protrudes to the hub. The protection lid couples to the second end portion of the fixing shaft to prevent lubricants for lubricating the bearing from splashing. The protection lid provides the impeller with protection to prevent the impeller from being compressed by external force to avoid destruction.

Abstract translation: 风扇结构包括盖，固定轴，轴承，叶轮和保护盖，其中盖包括底部，主体和容纳空间。 固定轴设置在容纳空间内，固定轴的第一端部联接底部，并且固定轴的第二端部突出到主体。 轴承联接到固定轴，固定轴的第二端部突出到轴承上，并且叶轮的毂联接到轴承。 固定轴的第二端部突出到轮毂。 保护盖联接到固定轴的第二端部，以防止润滑剂润滑轴承飞溅。 保护盖为叶轮提供保护，以防止叶轮被外力压缩，以免破坏。

公开(公告)号：US20080233522A1

公开(公告)日：2008-09-25

申请号：US12007018

申请日：2008-01-04

Applicant: Chien-Chung Fu ,  Heng-Chi Huang ,  Wen-Cheng Yang

Inventor： Chien-Chung Fu ,  Heng-Chi Huang ,  Wen-Cheng Yang

IPC: G03F7/26

CPC classification number: G03F7/2032

Abstract: A method of forming 3D micro structures with high aspect ratios includes the steps of: disposing a mask, which has a plurality of through holes having at least two different sizes, on a substrate to expose the substrate through the through holes; forming a negative photoresist layer on the mask and the substrate; providing a light source to illuminate the negative photoresist layer through the substrate and the through holes of the mask so as to form a plurality of exposed portions and an unexposed portion; and removing the unexposed portion and leaving the exposed portions to form a plurality of pillars each having a bottom portion contacting the substrate and a top portion opposite to the bottom portion. A top area of the top portion is slightly smaller than a bottom area of the bottom portion, and the pillars are allowed to have at least two different heights.

Abstract translation: 形成具有高纵横比的3D微结构的方法包括以下步骤：在衬底上设置具有至少两个不同尺寸的多个通孔的掩模，以通过通孔露出衬底; 在掩模和基板上形成负性光致抗蚀剂层; 提供光源以通过衬底和掩模的通孔照射负性光致抗蚀剂层，以形成多个暴露部分和未曝光部分; 并且去除未曝光部分并留下暴露部分以形成多个柱体，每个柱体具有接触基板的底部部分和与底部部分相对的顶部部分。 顶部的顶部区域略小于底部的底部区域，并且柱子被允许具有至少两个不同的高度。

公开(公告)号：US20080140195A1

公开(公告)日：2008-06-12

申请号：US11775878

申请日：2007-07-11

Applicant: Huan-Chieh Su ,  Hsieh Chen ,  Hsin Chen ,  Yen-Chung Chang ,  Shih-Rung Yeh ,  Weileun Fang ,  Chien-Chung Fu ,  Shiang-Cheng Lu ,  Tri-Rung Yew

Inventor： Huan-Chieh Su ,  Hsieh Chen ,  Hsin Chen ,  Yen-Chung Chang ,  Shih-Rung Yeh ,  Weileun Fang ,  Chien-Chung Fu ,  Shiang-Cheng Lu ,  Tri-Rung Yew

IPC: A61F2/02

CPC classification number: A61N1/05 ,  A61B5/04001 ,  A61B2562/0285 ,  A61N1/0536 ,  A61N1/0551

Abstract: A novel multifunctional nano-probe interface is proposed for applications in neural stimulation and detecting. The nano-probe interface structure consists of a carbon nanotube coated with a thin isolation layer, a micro-electrode substrate array, and a controller IC for neural cell recording and stimulation. The micro-electrode substrate array contains wires connecting the carbon nanotube with the controller IC, as well as microfluidic channels for supplying neural tissues with essential nutrition and medicine. The carbon nanotube is disposed on the micro-electrode substrate array made by silicon, coated with a thin isolation layer around thereof, and employed as a nano-probe for neural recording and stimulation.

Abstract translation: 提出了一种新颖的多功能纳米探针接口，用于神经刺激和检测。 纳米探针界面结构由涂覆有薄隔离层的碳纳米管，微电极基板阵列和用于神经细胞记录和刺激的控制器IC组成。 微电极基板阵列包含连接碳纳米管与控制器IC的电线，以及用于向神经组织提供必需营养和药物的微流体通道。 碳纳米管设置在由硅制成的微电极基板阵列上，在其周围涂覆有薄的隔离层，并用作用于神经记录和刺激的纳米探针。

公开(公告)号：US07906273B2

公开(公告)日：2011-03-15

申请号：US11798884

申请日：2007-05-17

Applicant: Chien-Chung Fu

Inventor： Chien-Chung Fu

IPC: G03F7/00

CPC classification number: B29C35/0894 ,  A61M37/0015 ,  A61M2037/0053 ,  B29C2035/0827 ,  B81B2201/055 ,  B81C1/00111

Abstract: A method of manufacturing a hollow micro-needle structure includes the steps of: disposing a first mask layer and a second mask layer respectively aside a first substrate and aside a rear surface of the first substrate, wherein the first substrate is transparent to predetermined light; forming a photoresist layer on the front surface of the first substrate and the first mask layer; providing the predetermined light to illuminate the first substrate in a direction from the rear surface to the front surface so as to expose the photoresist layer to form an exposed portion and an unexposed portion; and removing the unexposed portion to form the micro-needle structure, which is formed by the exposed portion. The micro-needle structure has an inclined sidewall and a through hole surrounded by the inclined sidewall.

Abstract translation: 一种中空微针结构体的制造方法，其特征在于，包括：将第一掩模层和第二掩模层分别配置在第一基板的外侧，将第一基板的背面放置在第一基板的背面， 在所述第一基板和所述第一掩模层的前表面上形成光致抗蚀剂层; 提供所述预定光以在从所述后表面到所述前表面的方向上照亮所述第一基板，以暴露所述光致抗蚀剂层以形成暴露部分和未曝光部分; 并且去除未曝光部分以形成由暴露部分形成的微针结构。 微针结构具有倾斜侧壁和由倾斜侧壁包围的通孔。