公开(公告)号：US20170106408A1

公开(公告)日：2017-04-20

申请号：US15128323

申请日：2014-10-22

Applicant: DAI NIPPON PRINTING CO., LTD.

Inventor： Naoko NAKATA ,  Kouji YOSHIDA ,  Naoshi KAWAMATA ,  Takaharu NAGAI ,  Koji ICHIMURA

IPC: B05D3/12 ,  B05D3/06 ,  G03F7/00

CPC classification number: B05D3/12 ,  B05D3/067 ,  B29C59/02 ,  G03F7/0002 ,  H01L21/027

Abstract: An imprint mold has a base 2, an uneven structure area A set on a surface 2a of the base 2, a measurement area 6 set in the uneven structure area A, and a measurement mark structure 7 positioned in the measurement area 6, the measurement mark structure 7 having a plurality of pattern sets 7a each having a line/space shape. With this, a deformation occurring in a resin layer at the time of release of the resin layer from the mold is prevented, and a measurement mark can be formed with high accuracy.