公开(公告)号：US20250132141A1

公开(公告)日：2025-04-24

申请号：US18685537

申请日：2022-08-23

Applicant: DH Technologies Development Pte. Ltd.

Inventor： Takashi BABA ,  Manuel FAUR ,  Tiberiu GERA ,  Robert HAUFLER ,  William LOYD ,  Pavel RYUMIN ,  Congsheng YOU

IPC: H01J49/02 ,  H01J49/00 ,  H01J49/42

Abstract: A system for applying RF voltages to a multipole ion processing device, configured for use in a mass spectrometer, includes a first RF generator configured to generate a first RF voltage and apply to a first pole electrode set, a second RF generator configured to generate a second RF voltage and apply to a second pole electrode set, a first amplitude adjustor configured to adjust an amplitude of the first RF voltage, a second amplitude adjustor configure to adjust an amplitude of the second RF voltage, and a phase adjustor in communication with the first RF generator and the second RF generator to adjust phase output of at least one of the first RF generator and the second RF generator so as to adjust a phase differential between the first RF voltage and the second RF voltage to be within a desired range.