SEMICONDUCTOR WAFER
    1.
    发明公开
    SEMICONDUCTOR WAFER 审中-公开

    公开(公告)号:US20240088066A1

    公开(公告)日:2024-03-14

    申请号:US18463771

    申请日:2023-09-08

    CPC classification number: H01L23/585 H01L21/78 H01L23/3192 H01L24/13

    Abstract: A semiconductor wafer (1a, 1b) including a plurality of chips (2) and a separation zone (3) spacing the semiconductor chips (2) from each other in this wafer (1a, 1b), such a separation zone (3) extending from a front face (4a) to an opposite backside face (4b) of this wafer (1a, 1b), this separation zone (3) includes a scribe line (6) configured to be diced using plasma etching and an inlet area (13) of this scribe line (6), the inlet (13) being delimitated by free ends of plasma etch-resistant material layers (9) extending each from a peripheral wall (20) of a functional part (18) of a chip (2) into the scribe line (6) by overlapping a top of a seal ring (7) of this chip (2).

Patent Agency Ranking