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公开(公告)号：US11203604B2
公开(公告)日：2021-12-21
申请号：US16706347
申请日：2019-12-06
Applicant: ENTEGRIS, INC.
Inventor： David Kuiper , Manish Khandelwal , Thomas M. Cameron , Thomas H. Baum , John Cleary
IPC: C07F7/08
Abstract: Provided is a process for preparing certain silane precursor compounds, e.g., triiodosilane from trichlorosilane utilizing lithium iodide in powder form and catalyzed by tertiary amines. The process provides triiodosilane in high yields and high purity. Triiodosilane is a precursor compound useful in the atomic layer deposition of silicon onto various microelectronic device structures.
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