公开(公告)号：US20150357159A1

公开(公告)日：2015-12-10

申请号：US14758466

申请日：2013-12-30

Applicant: FEI COMPANY

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317

CPC classification number: H01J37/317 ,  H01J37/3056 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/2814 ,  H01J2237/31745

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

Abstract translation: 一种用于分析具有带电粒子束的样品的方法，包括将束朝向样品表面引导; 铣削表面以暴露样品中的第二表面，其中远离离子源的第二表面的端部相对于参考深度比距离离子源的第一表面的端部更深的深度; 将带电粒子束引向第二表面以形成第二表面的一个或多个图像; 通过检测电子束与第二表面的相互作用形成感兴趣的多个相邻特征的横截面的图像; 将横截面的图像组装成感兴趣的一个或多个特征的三维模型。 提出了一种用于形成改进的基准并确定纳米尺度三维结构中暴露特征的深度的方法。

公开(公告)号：US20180301319A1

公开(公告)日：2018-10-18

申请号：US16012888

申请日：2018-06-20

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US10026590B2

公开(公告)日：2018-07-17

申请号：US14758466

申请日：2013-12-30

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US11315756B2

公开(公告)日：2022-04-26

申请号：US16012888

申请日：2018-06-20

Applicant: FEI Company

Inventor： Stacey Stone ,  Sang Hoon Lee ,  Jeffrey Blackwood ,  Michael Schmidt ,  Hyun Hwa Kim

IPC: H01J37/317 ,  H01J37/305

Abstract: A method for analyzing a sample with a charged particle beam including directing the beam toward the sample surface; milling the surface to expose a second surface in the sample in which the end of the second surface distal to ion source is milled to a greater depth relative to a reference depth than the end of the first surface proximal to ion source; directing the charged particle beam toward the second surface to form one or more images of the second surface; forming images of the cross sections of the multiple adjacent features of interest by detecting the interaction of the electron beam with the second surface; assembling the images of the cross section into a three-dimensional model of one or more of the features of interest. A method for forming an improved fiducial and determining the depth of an exposed feature in a nanoscale three-dimensional structure is presented.

公开(公告)号：US09488554B2

公开(公告)日：2016-11-08

申请号：US14432711

申请日：2013-10-07

Applicant: FEI Company

Inventor： Michael Schmidt ,  Hyun Hwa Kim ,  Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood

IPC: H01J37/00 ,  G01N1/32 ,  G01N1/28 ,  H01J37/20 ,  H01J37/305

CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。

公开(公告)号：US20150276567A1

公开(公告)日：2015-10-01

申请号：US14432711

申请日：2013-10-07

Applicant: FEI COMPANY

Inventor： Michael Schmidt ,  Hyun Hwa Kim ,  Sang Hoon Lee ,  Stacey Stone ,  Jeffrey Blackwood

IPC: G01N1/32 ,  H01J37/305 ,  H01J37/20

CPC classification number: G01N1/32 ,  G01N1/286 ,  H01J37/20 ,  H01J37/3053 ,  H01J2237/31745

Abstract: A method and system for exposing a portion of a structure in a sample for observation in a charged particle beam system, including extracting a sample from a bulk sample; determining an orientation of the sample that reduces curtaining; mounting the sample to a holder in the charged particle beam system so that the holder orients the sample in an orientation that reduces curtaining when the sample is milled to expose the structure; exposing the structure by milling the sample in a direction that reduces curtaining; and imaging the structure.

Abstract translation: 一种方法和系统，用于暴露用于在带电粒子束系统中观察的样品中的结构的一部分，包括从大量样品中提取样品; 确定减少绘制的样品的取向; 将样品安装到带电粒子束系统中的保持器上，使得保持器以样品取向使得当样品被研磨以暴露结构时减少绘制的取向; 通过在减少绘制的方向上研磨样品来暴露结构; 并对结构进行成像。