公开(公告)号：US20230377830A1

公开(公告)日：2023-11-23

申请号：US17750569

申请日：2022-05-23

Applicant: FEI COMPANY

Inventor： Jeremy Graham

IPC: H01J37/147 ,  H01J37/28

CPC classification number: H01J37/1471 ,  H01J37/28 ,  H01J2237/1501

Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, apparatus, computing devices, and computer-readable media. For example, some embodiments provide a scientific instrument comprising an ion-beam instrument configured to generate an ion beam including first and second sub-beams; an electron-beam instrument including a charged-particle-beam (CPB) lens having an adjustable setting controlling a magnetic force applied to the first and second sub-beams; and a computing device. The computing device is configured to: acquire an image by causing the ion-beam instrument to scan the ion beam across a sample using a selected setting of the CPB lens of the electron-beam instrument, apply automated image processing to the image to quantify an amount of spatial misalignment of the first and second sub-beams at the sample, and control the CPB lens of the electron-beam instrument to a setting based on the amount of spatial misalignment within the image.

公开(公告)号：US10763079B1

公开(公告)日：2020-09-01

申请号：US16279837

申请日：2019-02-19

Applicant: FEI Company

Inventor： Jeremy Graham ,  Lukas Kral

IPC: H01J37/30 ,  G01N23/2251 ,  H01J37/28

Abstract: A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.

公开(公告)号：US12154757B2

公开(公告)日：2024-11-26

申请号：US17750569

申请日：2022-05-23

Applicant: FEI COMPANY

Inventor： Jeremy Graham

IPC: H01J37/304 ,  H01J37/141 ,  H01J37/147 ,  H01J37/21 ,  H01J37/26 ,  H01J37/28 ,  H01J37/05

Abstract: Disclosed herein are scientific instrument support systems, as well as related methods, apparatus, computing devices, and computer-readable media. For example, some embodiments provide a scientific instrument comprising an ion-beam instrument configured to generate an ion beam including first and second sub-beams; an electron-beam instrument including a charged-particle-beam (CPB) lens having an adjustable setting controlling a magnetic force applied to the first and second sub-beams; and a computing device. The computing device is configured to: acquire an image by causing the ion-beam instrument to scan the ion beam across a sample using a selected setting of the CPB lens of the electron-beam instrument, apply automated image processing to the image to quantify an amount of spatial misalignment of the first and second sub-beams at the sample, and control the CPB lens of the electron-beam instrument to a setting based on the amount of spatial misalignment within the image.

公开(公告)号：US20200266030A1

公开(公告)日：2020-08-20

申请号：US16279837

申请日：2019-02-19

Applicant: FEI Company

Inventor： Jeremy Graham ,  Lukas Kral

IPC: H01J37/30 ,  H01J37/28 ,  G01N23/2251

Abstract: A dual beam system having a charged particle beam (CPB) lens and an ion beam column can operate in an analysis mode. In the analysis mode, an ion beam from the ion beam column can be deflected by the CPB into one or more component beams including a primary ion beam and one or more non-primary ion beams. The dual-beam system can identify the ion species of the non-primary ion beams.

公开(公告)号：US20130181140A1

公开(公告)日：2013-07-18

申请号：US13669626

申请日：2012-11-06

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  David William Tuggle ,  Jeremy Graham

IPC: G21K1/00

CPC classification number: G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.

Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。

公开(公告)号：US08907296B2

公开(公告)日：2014-12-09

申请号：US13669626

申请日：2012-11-06

Applicant: FEI Company

Inventor： N. William Parker ,  Mark W. Utlaut ,  David William Tuggle ,  Jeremy Graham

IPC: H01J3/14 ,  H01J37/09 ,  G21K1/00

CPC classification number: G21K1/00 ,  H01J37/09 ,  H01J2237/045 ,  H01J2237/0453

Abstract: An improved beam-defining aperture structure and method for fabrication is realized. An aperture opening is made in a thin conductive film positioned over a cavity in a support substrate, where the aperture size and shape is determined by the opening in the conductive film and not determined by the substrate.

Abstract translation: 实现了改进的光束限定孔结构和制造方法。 开口开口形成在位于支撑衬底中的空腔上方的薄导电膜中，其中孔径尺寸和形状由导电膜中的开口确定并且不由衬底确定。