公开(公告)号：US11972923B2

公开(公告)日：2024-04-30

申请号：US17566904

申请日：2021-12-31

Applicant: FEI Company

Inventor： Christopher Thompson ,  Dustin Ellis ,  Adam Stokes ,  Ronald Kelley ,  Cedric Bouchet-Marquis

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/3056 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2007 ,  H01J2237/208 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.

公开(公告)号：US12278087B2

公开(公告)日：2025-04-15

申请号：US18617227

申请日：2024-03-26

Applicant: FEI Company

Inventor： Christopher Thompson ,  Dustin Ellis ,  Adam Stokes ,  Ronald Kelley ,  Cedric Bouchet-Marquis

IPC: H01J37/305 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28

Abstract: Methods and systems for creating attachments between a sample manipulator and a sample within a charged particle systems are disclosed herein. Methods include translating a sample manipulator so that it is proximate to a sample, and milling portions of the sample manipulator such that portions are removed. The portion of the sample manipulator proximate to the sample is composed of a high sputter yield material, and the high sputter yield material may be the material milled with the charged particle beam such that it is removed from the sample manipulator. According to the present disclosure, the portions of the sample manipulator are milled such that at least some of the removed high sputter yield material redeposits to form an attachment between the sample manipulator and the sample.