公开(公告)号：US20230375445A1

公开(公告)日：2023-11-23

申请号：US17748878

申请日：2022-05-19

Applicant: FEI Company

Inventor： Michal HROUZEK ,  Krishna Kanth NEELISETTY ,  Petr WANDROL ,  Libor NOVAK

IPC: G01N1/32 ,  H01J37/305 ,  H01J37/20 ,  G01N1/28

CPC classification number: G01N1/32 ,  H01J37/3056 ,  H01J37/20 ,  G01N1/286

Abstract: Systems and methods for operating a broad ion beam (BIB) polisher in a sample preparation workflow having improved uptime, are disclosed. An example method for operating a broad ion beam (BIB) polisher having improved uptime according to the present invention comprises causing a first BIB source to emit a first broad ion beam towards a sample positioned within an interior volume of the BIB polisher while the first BIB source is in emitting the first broad ion beam towards the sample, removing a second BIB source from the BIB polisher that is configured to emit a second broad ion beam towards the sample when in use.

公开(公告)号：US20230420216A1

公开(公告)日：2023-12-28

申请号：US17748902

申请日：2022-05-19

Applicant: FEI Company

Inventor： Krishna Kanth NEELISETTY ,  Petr WANDROL ,  Ondrej KLVAC ,  Yakub FAM ,  Libor NOVAK ,  Michal HROUZEK

IPC: H01J37/305 ,  H01J37/20 ,  G01N1/32 ,  G01N1/28

CPC classification number: H01J37/3056 ,  G01N1/286 ,  G01N1/32 ,  H01J37/20

Abstract: Systems and methods for operating a combined laser and broad ion beam (BIB) polisher in a sample preparation workflow, are disclosed. An example method for operating a combined laser and broad ion beam (BIB) polisher according to the present invention comprises positioning a sample within the interior volume of the combined BIB and laser sample preparation system, causing a laser source component of the combined BIB and laser sample preparation system to emit an optical beam towards the sample, and causing a BIB source component of the combined BIB and laser sample preparation system to emit a broad ion beam towards the sample. The optical beam and the broad ion beam are each configured to cause a first portion and a second portion of the sample upon which it is incident to be removed, respectively.

公开(公告)号：US20230377833A1

公开(公告)日：2023-11-23

申请号：US17748927

申请日：2022-05-19

Applicant: FEI Company

Inventor： Michal HROUZEK ,  Libor NOVAK ,  Krishna Kanth NEELISETTY ,  Petr WANDROL

IPC: H01J37/20 ,  H01J37/305 ,  H01J37/244 ,  H01J37/302 ,  H01J37/304

CPC classification number: H01J37/20 ,  H01J37/3053 ,  H01J37/244 ,  H01J37/3023 ,  H01J37/304 ,  H01J2237/0822 ,  H01J2237/204 ,  H01J2237/24585

Abstract: Systems and methods for efficiently processing multiple samples with a BIB system, are disclosed. An example method for efficiently processing multiple samples with a BIB system according to the present invention comprises removing an individual sample holder containing a sample from a storage location within the BIB system, wherein the BIB system includes multiple sample holders positioned in one or more storage locations, loading the individual sample holder onto a sample stage configured to hold the sample holder during polishing of the corresponding sample held by the individual sample holder, and causing a BIB source to emit a broad ion beam towards the sample, wherein the broad ion beam removes at least a portion of the sample upon which it is incident. Once a desired portion of the sample is removed, the sample holder is removed from the sample stage and loaded back into the storage location.

公开(公告)号：US20220208508A1

公开(公告)日：2022-06-30

申请号：US17559762

申请日：2021-12-22

Applicant: FEI Company

Inventor： Oleksii KAPLENKO ,  Tomás VYSTAVEL ,  Petr WANDROL ,  Ondrej MACHEK

IPC: H01J37/22 ,  H01J37/244 ,  G06T7/00 ,  G06N3/04

Abstract: Apparatuses and processes for generating data for three-dimensional reconstruction are disclosed herein. An example method at least includes exposing a subsequent surface of a sample, acquiring an image of the subsequent surface, comparing the image of the subsequent surface to an image of a reference surface, based on the comparison exceeding a threshold, acquiring a compositional or crystalline map of the subsequent surface, and based on the comparison not exceeding the threshold, exposing a next surface.