公开(公告)号：US20200347240A1

公开(公告)日：2020-11-05

申请号：US16934306

申请日：2020-07-21

Applicant: Goodrich Corporation

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: C09D5/08 ,  C04B41/52 ,  C04B41/00 ,  C03C1/00 ,  C23C18/12 ,  C04B41/89 ,  F16D69/02 ,  B05D1/02 ,  B05D1/28 ,  C03C8/16 ,  C03C14/00 ,  C04B41/45 ,  C04B41/50 ,  C04B41/85

Abstract: A method for coating a composite structure, comprising applying a first slurry onto a surface of the composite structure, wherein the first slurry is a sol gel comprising a metal organic salt, a first carrier fluid, and a ceramic material, and heating the composite structure to a first sol gel temperature sufficient to form a sol gel-derived base layer on the composite structure.

公开(公告)号：US10767059B2

公开(公告)日：2020-09-08

申请号：US15234903

申请日：2016-08-11

Applicant: Goodrich Corporation

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: C09D5/08 ,  C04B41/52 ,  C04B41/00 ,  C03C1/00 ,  C23C18/12 ,  C04B41/89 ,  F16D69/02 ,  B05D1/02 ,  B05D1/28 ,  C03C8/16 ,  C03C14/00 ,  C04B41/45 ,  C04B41/50 ,  C04B41/85 ,  C04B111/00 ,  B64C25/34 ,  B64C25/42

Abstract: A method for coating a composite structure, comprising applying a first slurry onto a surface of the composite structure, wherein the first slurry is a sol gel comprising a metal organic salt, a first carrier fluid, and a ceramic material, and heating the composite structure to a first sol gel temperature sufficient to form a sol gel-derived base layer on the composite structure.

公开(公告)号：US20180044537A1

公开(公告)日：2018-02-15

申请号：US15234903

申请日：2016-08-11

Applicant: Goodrich Corporation

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: C09D5/08 ,  C03C14/00 ,  C04B41/45 ,  B05D1/28 ,  C04B41/85 ,  C04B41/52 ,  B05D1/02 ,  C03C8/16 ,  C04B41/50

Abstract: The present disclosure provides a method for coating a composite structure, comprising applying a first slurry onto a surface of the composite structure, wherein the first slurry is a sol gel comprising a metal organic salt, a first carrier fluid, and a ceramic material, and heating the composite structure to a first sol gel temperature sufficient to form a sol gel-derived base layer on the composite structure.

公开(公告)号：US20200148340A1

公开(公告)日：2020-05-14

申请号：US16190817

申请日：2018-11-14

Applicant: GOODRICH CORPORATION

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: B64C25/42

Abstract: An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

公开(公告)号：US20230211875A1

公开(公告)日：2023-07-06

申请号：US18120785

申请日：2023-03-13

Applicant: GOODRICH CORPORATION

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: F16D69/02 ,  C04B35/83 ,  C04B41/52 ,  C04B41/50 ,  C04B41/89 ,  C04B41/87 ,  C04B41/86 ,  F16D65/12 ,  B64C25/42

CPC classification number: F16D69/023 ,  C04B35/83 ,  C04B41/522 ,  C04B41/5064 ,  C04B41/5022 ,  C04B41/5015 ,  C04B41/5058 ,  C04B41/5059 ,  C04B41/89 ,  C04B41/87 ,  C04B41/86 ,  F16D65/126 ,  F16D65/127 ,  B64C25/42 ,  F16D2200/0047 ,  C04B2235/422 ,  C04B2235/5248 ,  F16D2065/132

Abstract: An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.

公开(公告)号：US11634213B2

公开(公告)日：2023-04-25

申请号：US16190817

申请日：2018-11-14

Applicant: GOODRICH CORPORATION

Inventor： Steven A. Poteet ,  Gavin Charles Richards ,  Zachary Cohen

IPC: C04B41/52 ,  C04B41/45 ,  C04B41/50 ,  B64C25/42 ,  F16D65/12 ,  B05D3/02 ,  B05D7/00 ,  B32B9/00 ,  B32B18/00

Abstract: An oxidation protection system disposed on a substrate is provided, which may comprise a boron layer comprising a boron compound disposed on the substrate; a silicon layer comprising a silicon compound disposed on the boron layer; and at least one sealing layer comprising monoaluminum phosphate and phosphoric acid disposed on the silicon layer.