公开(公告)号：US11764541B2

公开(公告)日：2023-09-19

申请号：US17220270

申请日：2021-04-01

Applicant: Gigaphoton Inc.

Inventor： Taisuke Miura ,  Osamu Wakabayashi ,  Hironori Igarashi

IPC: H01S3/23 ,  H01S5/00 ,  H01S5/042 ,  H01S5/068 ,  H01S5/50 ,  H01S5/0687 ,  G03F7/00 ,  H01S5/12

CPC classification number: H01S5/0428 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/2308 ,  H01S3/2375 ,  H01S5/0092 ,  H01S5/0687 ,  H01S5/06808 ,  H01S5/509 ,  H01S5/12 ,  H01S2301/163

Abstract: In a laser system according to a viewpoint of the present disclosure, a first amplifier amplifies first pulsed laser light outputted from a first semiconductor laser system into second pulsed laser light, a wavelength conversion system converts the second pulsed laser light in terms of wavelength into third pulsed laser light, and an excimer amplifier amplifies the third pulsed laser light. The first semiconductor laser system includes a first current controller that controls current flowing through a first semiconductor laser in such a way that first laser light outputted from the first semiconductor laser is caused to undergo chirping and a first semiconductor optical amplifier that amplifies the first laser light into pulsed light. The laser system includes a control section that controls the amount of chirping performed on the first pulsed laser light in such a way that excimer laser light having a target spectral linewidth is achieved.

公开(公告)号：US11350515B2

公开(公告)日：2022-05-31

申请号：US16919216

申请日：2020-07-02

Applicant: Gigaphoton Inc. ,  The University of Tokyo

Inventor： Hironori Igarashi ,  Kouji Kakizaki ,  Yohei Kobayashi ,  Shuntaro Tani

IPC: H05G2/00

Abstract: A laser system includes A. a laser apparatus configured to output pulsed laser light; B. a rare gas chamber; C. a light focusing optical system configured to focus the pulsed laser light in the rare gas chamber to excite the rare gas; D. a filter chamber configured to selectively transmit EUV light contained in harmonic light produced in the rare gas chamber; E. an exhauster connected to the filter chamber; F. at least one through hole disposed in the optical path between the rare gas chamber and the filter chamber; G. a rare gas supplier; H. a flow rate control valve configured to control the flow rate of the rare gas flowing from the rare gas supplier into the rare gas chamber; I. a first pressure sensor configured to detect the pressure of the rare gas in the rare gas chamber; J. a first controller configured to control the flow rate control valve in such a way that the pressure detected with the first pressure sensor falls within a reference range; and K. a second controller configured to control the pulse energy of the pulsed laser light outputted from the laser apparatus based at least on the pressure detected with the first pressure sensor.

公开(公告)号：US11226536B2

公开(公告)日：2022-01-18

申请号：US16987972

申请日：2020-08-07

Applicant: Gigaphoton Inc. ,  The University of Tokyo

Inventor： Chen Qu ,  Yohei Kobayashi ,  Zhigang Zhao ,  Hironori Igarashi

IPC: G03B27/54 ,  G02F1/35 ,  G02F1/355 ,  G03F7/20

Abstract: A wavelength conversion system including: A. a first nonlinear optical crystal to which first pulsed laser light having a first polarization state and a first wavelength and second pulsed laser light having a second polarization state and a second wavelength are inputted and which is configured to output in response to the input the second pulsed laser light and first sum frequency light having the second polarization state and a third wavelength produced by sum frequency mixing of the first wavelength with the second wavelength; and B. a second nonlinear optical crystal to which the first sum frequency light and the second pulsed laser light outputted from the first nonlinear optical crystal are inputted and which is configured to output in response to the input third pulsed laser light having a fourth wavelength.