Inspection apparatus
    1.
    发明授权
    Inspection apparatus 有权
    检验仪器

    公开(公告)号:US09151719B2

    公开(公告)日:2015-10-06

    申请号:US14361657

    申请日:2012-11-19

    Abstract: When it is tried to detect a microscopic defect, it is desired that the width of the above-mentioned illuminated region in the minor axis direction should be short. In the related art, although an illuminated region is formed by converging light by some means, it is not easy to form an illuminated region with a narrower width. This is because various aberrations possessed by optical elements themselves used for convergence, aberrations possessed by other optical elements disposed on optical paths, assembly errors, and the like have undesired influence on the formation of linear illumination. In the related art, sufficient consideration has not been paid to the above points. The present invention is characterized in that it includes a system for changing the wavefront of light.

    Abstract translation: 当试图检测微观缺陷时,期望上述照明区域在短轴方向上的宽度应该较短。 在现有技术中,虽然通过某种方式会聚光来形成照明区域,但是不容易形成具有较窄宽度的照明区域。 这是因为用于会聚的光学元件本身具有的各种像差,设置在光路上的其他光学元件所具有的像差,组装误差等对线形照明的形成具有不期望的影响。 在现有技术中,还没有充分考虑上述几点。 本发明的特征在于它包括用于改变光的波前的系统。

    Far-infrared imaging device and far-infrared imaging method

    公开(公告)号:US10203278B2

    公开(公告)日:2019-02-12

    申请号:US15100441

    申请日:2015-01-07

    Inventor: Kei Shimura

    Abstract: Provided are an imaging method and device for imaging using far infrared light that make it possible to quickly image a subject without producing damage or a non-linear phenomenon in the subject. A variable-frequency coherent light source is used, illumination light from the light source is irradiated onto a linear area on an imaging subject, transmitted or reflected light is used to form an image of the imaging subject, a non-linear optical crystal is used for wavelength conversion, and a one-dimensional or two-dimensional array sensor is used to image the imaging subject while the imaging subject is moved in at least one direction.

    Far-Infrared Spectroscopy Device
    4.
    发明申请

    公开(公告)号:US20200088577A1

    公开(公告)日:2020-03-19

    申请号:US16689802

    申请日:2019-11-20

    Abstract: This far-infrared spectroscopy device is provided with: a variable wavelength far-infrared light source that generates first far-infrared light; an illuminating optical system that irradiates a sample with the first far-infrared light; a detecting nonlinear optical crystal that converts second far-infrared light into near-infrared light using pump light, said second far-infrared light having been transmitted from the sample; and a far-infrared image-forming optical system that forms an image of the sample in the detecting nonlinear optical crystal. The irradiation position of the first far-infrared light on the sample does not depend on the wavelength of the first far-infrared light.

    Defect inspection method and its device
    6.
    发明授权
    Defect inspection method and its device 有权
    缺陷检查方法及其装置

    公开(公告)号:US09513228B2

    公开(公告)日:2016-12-06

    申请号:US14377753

    申请日:2012-10-22

    Abstract: To increase the illumination efficiency by facilitating the change of the incident angle of illumination light with a narrow illumination width according to an inspection object and enabling an illumination region to be effectively irradiated with light, provided is a defect inspection method for obliquely irradiating a sample mounted on a table that is moving continuously in one direction with illumination light, collecting scattered light from the sample obliquely irradiated with the illumination light, detecting an image of the surface of the sample formed by the scattered light, processing a signal obtained by detecting the image formed by the scattered light, and extracting a defect candidate, wherein the oblique irradiation of the light is implemented by linearly collecting light emitted from a light source, and obliquely projecting the collected light onto the surface of the sample, thereby illuminating a linear region on the surface of the sample.

    Abstract translation: 为了通过根据检查对象促进具有窄照明宽度的照明光的入射角的改变来提高照明效率,并且能够有效地照射照明区域,所以提供了一种用于倾斜照射安装的样品的缺陷检查方法 在利用照明光在一个方向上连续移动的台上,从倾斜照射照明光的样本收集散射光,检测由散射光形成的样品的表面的图像,处理通过检测图像而获得的信号 通过散射光形成并提取缺陷候选物,其中光的倾斜照射是通过线性收集从光源发射的光,并将收集的光倾斜地投射到样品的表面上,从而照亮线上区域 样品的表面。

    Defect inspection apparatus and defect inspection method
    7.
    发明授权
    Defect inspection apparatus and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US08921798B2

    公开(公告)日:2014-12-30

    申请号:US13789156

    申请日:2013-03-07

    Inventor: Kei Shimura

    Abstract: Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region, In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture.

    Abstract translation: 公开了实现短波长,高功率光源和大数值孔径检测的方法,提高了高性能光学元件的缺陷检测灵敏度。 短波长大功率激光器通过使用适合于在短波长区域中产生高输出功率的脉冲振荡型激光器实现,此外,激光器的光谱带宽变窄,使得检测光学器件的色差量 单玻璃材料(即不补偿色差)降低到允许的水平。 使用高度可加工的玻璃材料来构造检测光学元件,即使对于大NA而言镜片的数量增加或透镜不具有旋转对称的孔径,也能够实现所需的表面精度或轮廓不规则条件。

    INSPECTION APPARATUS
    8.
    发明申请
    INSPECTION APPARATUS 有权
    检查装置

    公开(公告)号:US20140333923A1

    公开(公告)日:2014-11-13

    申请号:US14361657

    申请日:2012-11-19

    Abstract: When it is tried to detect a microscopic defect, it is desired that the width of the above-mentioned illuminated region in the minor axis direction should be short. In the related art, although an illuminated region is formed by converging light by some means, it is not easy to form an illuminated region with a narrower width. This is because various aberrations possessed by optical elements themselves used for convergence, aberrations possessed by other optical elements disposed on optical paths, assembly errors, and the like have undesired influence on the formation of linear illumination. In the related art, sufficient consideration has not been paid to the above points. The present invention is characterized in that it includes a system for changing the wavefront of light.

    Abstract translation: 当试图检测微观缺陷时,期望上述照明区域在短轴方向上的宽度应该较短。 在现有技术中,虽然通过某种方式会聚光来形成照明区域,但是不容易形成具有较窄宽度的照明区域。 这是因为用于会聚的光学元件本身具有的各种像差,设置在光路上的其他光学元件所具有的像差,组装误差等对线形照明的形成具有不期望的影响。 在现有技术中,还没有充分考虑上述几点。 本发明的特征在于它包括用于改变光的波前的系统。

    Far-infrared spectroscopic device and far-infrared spectroscopic method

    公开(公告)号:US11016023B1

    公开(公告)日:2021-05-25

    申请号:US16638638

    申请日:2017-08-22

    Abstract: In an is-TPG method in which lasers having two different wavelengths are used to generate a wavelength-variable far-infrared light, a far-infrared light (TPG light) having an unstable output at a broad wavelength is also slightly generated at the same time with only one laser light. The generated is-TPG and the TPG light are converted, after passing through a specimen, to near-infrared light inside a nonlinear optical crystal for detection and are observed by a detector. The signal light output of the is-TPG light becomes unstable due to the TPG light. According to the present invention, the TPG light is removed by means of a slit and the like (filter) immediately before the specimen and is not introduced into the nonlinear optical crystal for detection. At this time, by using a change in the emission direction when the frequency of the is TPG light is changed, the filter is moved in accordance with the frequency so that only the is-TPG light passes therethrough (see FIG. 1C).

    Defect inspection apparatus and defect inspection method
    10.
    发明授权
    Defect inspection apparatus and defect inspection method 有权
    缺陷检查装置和缺陷检查方法

    公开(公告)号:US09194795B2

    公开(公告)日:2015-11-24

    申请号:US14551230

    申请日:2014-11-24

    Inventor: Kei Shimura

    Abstract: Method for realizing an inspection with short wavelength, high power light source and large numerical aperture, high performance optics to improve defect inspection sensitivity is disclosed. Short wavelength high power laser is realized by using a pulse oscillation type laser suitable for generation of high output power in a short-wavelength region. In addition, a spectral bandwidth of the laser is narrowed down so that amount of chromatic aberration of detection optics with single glass material (i.e. without compensation of chromatic aberration) is lowered to permissible level. Using highly workable glass material to construct the detection optics enables necessary surface accuracy or profile irregularity conditions to be met, even if the number of lenses is increased for large NA or the lens doesn't have a rotationally symmetrical aperture.

    Abstract translation: 公开了实现短波长,高功率光源和大数值孔径检测的方法,提高了高性能光学元件的缺陷检测灵敏度。 通过使用适合于在短波长区域中产生高输出功率的脉冲振荡型激光器来实现短波长大功率激光器。 此外,激光器的光谱带宽变窄,使得具有单一玻璃材料的检测光学器件(即,没有色差的补偿)的色差量降低到允许的水平。 使用高度可加工的玻璃材料来构造检测光学元件,即使对于大NA而言镜片的数量增加或透镜不具有旋转对称的孔径,也能够实现所需的表面精度或轮廓不规则条件。

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