公开(公告)号：US08760643B2

公开(公告)日：2014-06-24

申请号：US13915161

申请日：2013-06-11

Applicant: Hitachi High-Technologies Corporation

Inventor： Sachio Uto ,  Hidetoshi Nishiyama ,  Minori Noguchi

IPC: G01N21/00 ,  H01L21/02 ,  G01B11/30 ,  G01B11/06 ,  G01N3/04

CPC classification number: H01L21/02334 ,  B08B6/00 ,  G01B11/0625 ,  G01B11/303 ,  G01N3/04 ,  G01N21/15 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/9563 ,  H01L21/02057 ,  H01L21/02082

Abstract: An aspect of the invention provides a defect inspection apparatus being able to accurately inspect a micro foreign matter or defect at a high speed for an inspection target substrate in which a repetitive pattern and a non-repetitive pattern are mixed.In a foreign matter anti-adhesive means 180, a transparent plate 187 is placed on a placement table 34 through a frame 185. In the foreign matter anti-adhesive means 180, a shaft 181 which is rotatably supported by two columnar supports 184 fixed onto a base 186 is coupled to a motor 182 by a coupling 183. The shaft 181 is inserted into a part of a frame 185 between the two columnar supports 184 such that the frame 185 and the transparent plate 187 are turnable about the shaft 181. Therefore, the whole of the frame 185 is opened and closed in a Z-direction about the shaft 181, and a wafer 1 on the placement table 34 can be covered with the frame 185 and the transparent plate 187.

Abstract translation: 本发明的一个方面提供了一种缺陷检查装置，其能够精确地检查混合有重复图案和非重复图案的检查对象基板的高速微细异物或缺陷。 在异物防粘装置180中，通过框架185将透明板187放置在放置台34上。在异物防粘装置180中，轴181由可固定在 基座186通过联轴器183联接到马达18.轴181插入到两个柱状支撑件184之间的框架185的一部分中，使得框架185和透明板187围绕轴181可转动。因此 ，整个框架185围绕轴181沿Z方向打开和关闭，并且放置台34上的晶片1可以被框架185和透明板187覆盖。

公开(公告)号：US09151719B2

公开(公告)日：2015-10-06

申请号：US14361657

申请日：2012-11-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Taniguchi ,  Kei Shimura ,  Sachio Uto

IPC: G01N21/00 ,  G01N21/95 ,  G01N21/956 ,  G02B26/06 ,  G02B26/08 ,  G01N21/47

CPC classification number: G01N21/9505 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/95684 ,  G01N2021/4707 ,  G02B26/06 ,  G02B26/0825

Abstract: When it is tried to detect a microscopic defect, it is desired that the width of the above-mentioned illuminated region in the minor axis direction should be short. In the related art, although an illuminated region is formed by converging light by some means, it is not easy to form an illuminated region with a narrower width. This is because various aberrations possessed by optical elements themselves used for convergence, aberrations possessed by other optical elements disposed on optical paths, assembly errors, and the like have undesired influence on the formation of linear illumination. In the related art, sufficient consideration has not been paid to the above points. The present invention is characterized in that it includes a system for changing the wavefront of light.

Abstract translation: 当试图检测微观缺陷时，期望上述照明区域在短轴方向上的宽度应该较短。 在现有技术中，虽然通过某种方式会聚光来形成照明区域，但是不容易形成具有较窄宽度的照明区域。 这是因为用于会聚的光学元件本身具有的各种像差，设置在光路上的其他光学元件所具有的像差，组装误差等对线形照明的形成具有不期望的影响。 在现有技术中，还没有充分考虑上述几点。 本发明的特征在于它包括用于改变光的波前的系统。

公开(公告)号：US09976966B2

公开(公告)日：2018-05-22

申请号：US15299662

申请日：2016-10-21

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Yukihiro Shibata ,  Kei Shimura ,  Sachio Uto ,  Toshifumi Honda

IPC: G01N21/00 ,  G01N21/88 ,  G01N21/956 ,  G01N21/94 ,  G01N21/958 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/958 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/12 ,  G03F7/7065

Abstract: To increase the illumination efficiency by facilitating the change of the incident angle of illumination light with a narrow illumination width according to an inspection object and enabling an illumination region to be effectively irradiated with light, provided is a defect inspection method for obliquely irradiating a sample mounted on a table that is moving continuously in one direction with illumination light, collecting scattered light from the sample obliquely irradiated with the illumination light, detecting an image of the surface of the sample formed by the scattered light, processing a signal obtained by detecting the image formed by the scattered light, and extracting a defect candidate, wherein the oblique irradiation of the light is implemented by linearly collecting light emitted from a light source, and obliquely projecting the collected light onto the surface of the sample, thereby illuminating a linear region on the surface of the sample.

公开(公告)号：US20150022806A1

公开(公告)日：2015-01-22

申请号：US14377753

申请日：2012-10-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yukihiro Shibata ,  Kei Shimura ,  Sachio Uto ,  Toshifumi Honda

IPC: G01N21/94 ,  G01N21/95 ,  G01N21/958 ,  G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/958 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/12 ,  G03F7/7065

Abstract: To increase the illumination efficiency by facilitating the change of the incident angle of illumination light with a narrow illumination width according to an inspection object and enabling an illumination region to be effectively irradiated with light, provided is a defect inspection method for obliquely irradiating a sample mounted on a table that is moving continuously in one direction with illumination light, collecting scattered light from the sample obliquely irradiated with the illumination light, detecting an image of the surface of the sample formed by the scattered light, processing a signal obtained by detecting the image formed by the scattered light, and extracting a defect candidate, wherein the oblique irradiation of the light is implemented by linearly collecting light emitted from a light source, and obliquely projecting the collected light onto the surface of the sample, thereby illuminating a linear region on the surface of the sample.

Abstract translation: 为了通过根据检查对象促进具有窄照明宽度的照明光的入射角的改变来提高照明效率，并且能够有效地照射照明区域，所以提供了一种用于倾斜照射安装的样本的缺陷检查方法 在利用照明光在一个方向上连续移动的台上，从倾斜照射照明光的样本收集散射光，检测由散射光形成的样品的表面的图像，处理通过检测图像而获得的信号 通过散射光形成并提取缺陷候选物，其中光的倾斜照射是通过线性收集从光源发射的光，并将收集的光倾斜地投射到样品的表面上，从而照亮线上区域 样品的表面。

公开(公告)号：US09513228B2

公开(公告)日：2016-12-06

申请号：US14377753

申请日：2012-10-22

Applicant: Hitachi High-Technologies Corporation

Inventor： Yukihiro Shibata ,  Kei Shimura ,  Sachio Uto ,  Toshifumi Honda

IPC: G01N21/00 ,  G01N21/94 ,  G01N21/956 ,  G01N21/95 ,  G03F7/20 ,  G01N21/88 ,  G01N21/958

CPC classification number: G01N21/8806 ,  G01N21/8851 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/958 ,  G01N2021/8822 ,  G01N2021/8848 ,  G01N2201/06113 ,  G01N2201/068 ,  G01N2201/0697 ,  G01N2201/12 ,  G03F7/7065

Abstract: To increase the illumination efficiency by facilitating the change of the incident angle of illumination light with a narrow illumination width according to an inspection object and enabling an illumination region to be effectively irradiated with light, provided is a defect inspection method for obliquely irradiating a sample mounted on a table that is moving continuously in one direction with illumination light, collecting scattered light from the sample obliquely irradiated with the illumination light, detecting an image of the surface of the sample formed by the scattered light, processing a signal obtained by detecting the image formed by the scattered light, and extracting a defect candidate, wherein the oblique irradiation of the light is implemented by linearly collecting light emitted from a light source, and obliquely projecting the collected light onto the surface of the sample, thereby illuminating a linear region on the surface of the sample.

Abstract translation: 为了通过根据检查对象促进具有窄照明宽度的照明光的入射角的改变来提高照明效率，并且能够有效地照射照明区域，所以提供了一种用于倾斜照射安装的样品的缺陷检查方法 在利用照明光在一个方向上连续移动的台上，从倾斜照射照明光的样本收集散射光，检测由散射光形成的样品的表面的图像，处理通过检测图像而获得的信号 通过散射光形成并提取缺陷候选物，其中光的倾斜照射是通过线性收集从光源发射的光，并将收集的光倾斜地投射到样品的表面上，从而照亮线上区域 样品的表面。

公开(公告)号：US20140333923A1

公开(公告)日：2014-11-13

申请号：US14361657

申请日：2012-11-19

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Taniguchi ,  Kei Shimura ,  Sachio Uto

IPC: G01N21/95

CPC classification number: G01N21/9505 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/95684 ,  G01N2021/4707 ,  G02B26/06 ,  G02B26/0825

Abstract: When it is tried to detect a microscopic defect, it is desired that the width of the above-mentioned illuminated region in the minor axis direction should be short. In the related art, although an illuminated region is formed by converging light by some means, it is not easy to form an illuminated region with a narrower width. This is because various aberrations possessed by optical elements themselves used for convergence, aberrations possessed by other optical elements disposed on optical paths, assembly errors, and the like have undesired influence on the formation of linear illumination. In the related art, sufficient consideration has not been paid to the above points. The present invention is characterized in that it includes a system for changing the wavefront of light.

Abstract translation: 当试图检测微观缺陷时，期望上述照明区域在短轴方向上的宽度应该较短。 在现有技术中，虽然通过某种方式会聚光来形成照明区域，但是不容易形成具有较窄宽度的照明区域。 这是因为用于会聚的光学元件本身具有的各种像差，设置在光路上的其他光学元件所具有的像差，组装误差等对线形照明的形成具有不期望的影响。 在现有技术中，还没有充分考虑上述几点。 本发明的特征在于它包括用于改变光的波前的系统。