公开(公告)号：US20140021350A1

公开(公告)日：2014-01-23

申请号：US13789346

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi NISHIHAMA ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

公开(公告)号：US20130264479A1

公开(公告)日：2013-10-10

申请号：US13855977

申请日：2013-04-03

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Atsuko YAMAGUCHI ,  Yasunari SOHDA ,  Tatsuya MAEDA ,  Osamu NASU ,  Hiroki KAWADA

IPC: H01J37/26

CPC classification number: H01J37/265 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2817

Abstract: In order that a displacement between patterns of different heights, formed on a sample in a plurality of different pattern-forming steps, can be measured at fixed throughput and with high accuracy, correspondence between parameters of lenses and beam deflector of an electron optical system and an angle of incidence of a beam upon the sample is recorded as data, then a correction value for the amount of displacement or edge positions is calculated, and a true amount of displacement is calculated from the correction value and an image under observation.

Abstract translation: 为了在多个不同的图案形成步骤中形成在样品上的不同高度的图案之间的位移可以以固定的生产量和高精度测量，透镜的参数和电子光学系统的光束偏转器之间的对应关系，以及 将样本上的光束的入射角记录为数据，然后计算位移量或边缘位置的校正值，并根据校正值和观察图像计算真实的位移量。

公开(公告)号：US20140021349A1

公开(公告)日：2014-01-23

申请号：US13789323

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Nishihama ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

Abstract translation: 本发明的目的是提供一种在同时减少落在待测图案上的光束的剂量的同时执行高精度凹凸确定（例如，区分线段和空间）的图案测量装置。 为了实现该目的，本发明提出了一种图形测量装置，其通过相对于与测量对象区域不同的另一区域扫描倾斜的豆来指定测量对象区域中的图案，然后基于图案指定结果进行测量。 通过这样的布置，可以在降低射击测量对象区域的光束的剂量的情况下进行测量而不会出现错误的图案指定的风险。