公开(公告)号：US20140021350A1

公开(公告)日：2014-01-23

申请号：US13789346

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi NISHIHAMA ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

公开(公告)号：US20180005363A1

公开(公告)日：2018-01-04

申请号：US15544643

申请日：2015-01-30

Applicant: Hitachi High-Technologies Corporation

Inventor： Wataru NAGATOMO ,  Yuichi ABE ,  Mitsuji IKEDA

IPC: G06T7/00 ,  G06K9/46 ,  G06K9/62 ,  H01J37/28 ,  G06T7/73 ,  G06T3/00 ,  G06T7/13 ,  H01J37/26

CPC classification number: G06T7/001 ,  G01B15/00 ,  G06K9/4604 ,  G06K9/6202 ,  G06K9/6204 ,  G06T3/0068 ,  G06T7/13 ,  G06T7/74 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/261 ,  H01J37/28 ,  H01J2237/2817

Abstract: The purpose of the present invention is to provide a pattern matching device and computer program that carry out highly accurate positioning even if edge positions and numbers change. The present invention proposes a computer program and a pattern matching device wherein a plurality of edges included in first pattern data to be matched and a plurality of edges included in second pattern data to be matched with the first pattern data are associated, a plurality of different association combinations are prepared, the plurality of association combinations are evaluated using index values for the plurality of edges, and matching processing is carried out using the association combinations selected through the evaluation.

公开(公告)号：US20140021349A1

公开(公告)日：2014-01-23

申请号：US13789323

申请日：2013-03-07

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hiroshi Nishihama ,  Tatsuya MAEDA ,  Mitsuji IKEDA ,  Susumu KOYAMA

IPC: H01J37/26

CPC classification number: H01J37/26 ,  H01J37/263 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24578 ,  H01J2237/2809

Abstract: An object of the present invention is to provide a pattern measuring apparatus which performs high-accuracy concavity/convexity determination (e.g., distinguishing between a line segment and space) while simultaneously reducing the dose of a beam falling onto a pattern to be measured. To attain the object, this invention proposes a pattern measuring apparatus which specifies a pattern in a measurement object area by scanning a tilted bean with respect to another area different from the measurement object area and then performs measurement based on the pattern-specifying result. With such arrangement, it becomes possible to perform measurement without the risk of wrong pattern designation while lowering the dose of a beam hitting the measurement object area.

Abstract translation: 本发明的目的是提供一种在同时减少落在待测图案上的光束的剂量的同时执行高精度凹凸确定（例如，区分线段和空间）的图案测量装置。 为了实现该目的，本发明提出了一种图形测量装置，其通过相对于与测量对象区域不同的另一区域扫描倾斜的豆来指定测量对象区域中的图案，然后基于图案指定结果进行测量。 通过这样的布置，可以在降低射击测量对象区域的光束的剂量的情况下进行测量而不会出现错误的图案指定的风险。