-
公开(公告)号：US20180149962A1
公开(公告)日：2018-05-31
申请号：US15580331
申请日：2016-06-08
Applicant: HOYA CORPORATION
Inventor： Takumi KOBAYASHI , Kazuhiro HAMAMOTO , Tatsuo ASAKAWA , Tsutomu SHOKI
Abstract: A substrate with an electrically conductive film for fabricating a reflective mask is obtained that is capable of preventing positional shift of the reflective mask during pattern transfer. Provided is a substrate with an electrically conductive film used in lithography, the substrate with an electrically conductive film having an electrically conductive film formed on one of the main surfaces of a mask blank substrate, and a coefficient of static friction of the surface of the electrically conductive film is not less than 0.25.
Search Results
1
records
(took 0.012 seconds)
筛选
AND
AND
过滤
NOT
NOT
Scan to Join
