公开(公告)号：US20180237909A1

公开(公告)日：2018-08-23

申请号：US15691593

申请日：2017-08-30

Applicant: HZO, Inc.

Inventor： Yang Yun ,  Max Sorensen ,  Chien-Lan Hsueh ,  Tining Su ,  Jim Dempster ,  Alex Anderson ,  Layton Baker

IPC: C23C16/455 ,  H01L21/67 ,  H01L21/677 ,  C23C16/52

Abstract: A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.

公开(公告)号：US10669627B2

公开(公告)日：2020-06-02

申请号：US15691593

申请日：2017-08-30

Applicant: HZO, Inc.

Inventor： Yang Yun ,  Max Sorenson ,  Chien-Lan Hsueh ,  Tining Su ,  Jim Dempster ,  Alex Anderson ,  Layton Baker

IPC: C23C16/455 ,  H01L21/67 ,  H01L21/677 ,  C23C16/44 ,  C23C16/00 ,  C23C16/52 ,  H01L21/02

Abstract: A modular multilayer deposition system includes a plurality of modular deposition chambers, including at least one parylene deposition chamber and at least one ALD deposition chamber. The parylene deposition chamber is connected in series with the ALD deposition chamber. Substrates are automatically moved from within the parylene deposition chamber to within the ALD deposition chamber or from within the ALD deposition chamber to the parylene deposition chamber.

公开(公告)号：US10786981B2

公开(公告)日：2020-09-29

申请号：US15644610

申请日：2017-07-07

Applicant: HZO, Inc.

Inventor： Robert Askin ,  Joshua Su ,  Melon Yu ,  Alex Anderson ,  Wei Li ,  Wan-Man Liu ,  Zhi-Guang Chen

IPC: B32B37/00 ,  H05K13/04 ,  H05K3/00 ,  B05C5/00 ,  B05C9/06 ,  B05C13/00 ,  B32B7/12 ,  B32B37/02

Abstract: An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.

公开(公告)号：US20180117893A1

公开(公告)日：2018-05-03

申请号：US15644610

申请日：2017-07-07

Applicant: HZO, Inc.

Inventor： Robert Askin ,  Joshua Su ,  David Melon ,  Alex Anderson ,  Wei Li ,  Wan-Man Liu ,  Zhi-Guang Chen

IPC: B32B37/00 ,  B05C5/00 ,  B05C9/06 ,  B32B7/12 ,  B05C13/00 ,  B32B37/02

Abstract: An automated masking system includes a substrate loading apparatus designed to hold a plurality of substrates, a first masking material application station designed to automatically apply a first masking material to a portion of the substrate, and a second masking material application station designed to automatically apply a second masking material to a portion of the substrate, the second masking material being different than the first masking material. The system includes a first dispensing apparatus and a second dispensing apparatus that move relative to the substrate in a repeatable motion. The substrate moves automatically from the first masking material application station to the second masking material application station.