公开(公告)号：US20210407763A1

公开(公告)日：2021-12-30

申请号：US17279039

申请日：2019-08-09

Applicant: Hitachi, Ltd.

Inventor： Takafumi MIWA ,  Hirokazu TAMAKI ,  Momoyo ENYAMA ,  Makoto SAKAKIBARA ,  Sayaka KURATA ,  Atsuko SHINTANI ,  Takashi DOBASHI ,  Kotoko URANO ,  Akiko KAGATSUME ,  Minseok PARK ,  Yasuhiro SHIRASAKI ,  Thantip KRASIENAPIBAL

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/22

Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.