公开(公告)号：US20200225175A1

公开(公告)日：2020-07-16

申请号：US16603663

申请日：2018-03-16

Applicant: HITACHI, LTD.

Inventor： Akiko KAGATSUME ,  Minseok PARK ,  Momoyo ENYAMA ,  Yasuhiro SHIRASAKI ,  Michio HATANO

IPC: G01N23/2206 ,  G01N23/2204

Abstract: The purpose of the present invention is to provide a multi-coordinated analyzing device that makes it possible to readily observe the same visual field by using a plurality of different kinds of analyzing device and in which observation results for the same visual field are recorded collectively. An analyzing system according to the present invention includes: a first analyzing unit that obtains first observation data by analyzing a sample and that also obtains position information about the analyzed sample; a position setting unit that performs position alignment of the sample on the basis of the position information obtained by the first analyzing unit; and a second analyzing unit that obtains second observation data by analyzing, by using a method different from the method used by the first analyzing unit, the sample placed at the position aligned by the position setting unit (see FIG. 1).

公开(公告)号：US20180261425A1

公开(公告)日：2018-09-13

申请号：US15918464

申请日：2018-03-12

Applicant: Hitachi, Ltd.

Inventor： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Kaori SHIRAHATA ,  Makoto SAKAKIBARA

IPC: H01J37/244 ,  H01J37/20 ,  H01J37/10 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/2443 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/28

Abstract: A charged particle detector including a scintillator that is irradiated with charged particles, a fluorescent film being in contact with a first surface facing a second surface of the scintillator, the second surface being irradiated with the charged particles, and a photodetector that detects luminescence of the fluorescent film, wherein the fluorescent film has a plurality of regions, the plurality of regions respectively have phosphors that absorb luminescence of the scintillator and emit light with different wavelengths from one another, and a charged particle beam device using the charged particle detector.

公开(公告)号：US20180033587A1

公开(公告)日：2018-02-01

申请号：US15664131

申请日：2017-07-31

Applicant: HITACHI, LTD.

Inventor： Momoyo ENYAMA ,  Yasuhiro SHIRASAKI ,  Natsuki TSUNO

IPC: H01J37/08

CPC classification number: H01J37/08 ,  H01J2237/15

Abstract: A charged particle beam apparatus includes a charged particle source, a separator, a charged particle beam irradiation switch, and a control device. The separator is inserted into a charged particle optical system and deflects a traveling direction of a charged particle beam out of an optical axis of the charged particle optical system or deflects the traveling direction in the optical axis of the charged particle optical system. The charged particle beam irradiation switch absorbs the charged particle beam deflected out of the optical axis of the charged particle optical system or reflects the charged particle beam toward the separator. The control device controls a charged particle beam irradiation switch.

公开(公告)号：US20180025886A1

公开(公告)日：2018-01-25

申请号：US15550182

申请日：2015-02-18

Applicant: Hitachi, Ltd.

Inventor： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Hiroya OHTA

IPC: H01J37/153 ,  H01J37/145 ,  H01J37/14

CPC classification number: H01J37/153 ,  H01J37/14 ,  H01J37/145

Abstract: An aberration corrector includes a mirror that corrects an aberration of a charged particle beam, a beam separator, and a bypass optical system in the beam separator. The beam separator includes an entrance of the charged particle beam and an exit from which the charged particle beam is emitted to an objective lens, and separates an incident trajectory from the entrance to the mirror and a reflection trajectory from the mirror to the exit from each other by deflecting the charged particle beam in an ON state. The bypass optical system is disposed at a position at which the trajectory of the charged particle beam bypasses when the beam separator is in the ON state, and the trajectory of the charged particle beam passes when the beam separator is in an OFF state, and controls the charged particle beam so that objective lens optical conditions in a trajectory via the mirror and a trajectory passing through the bypass optical system coincide with each other.

公开(公告)号：US20190035597A1

公开(公告)日：2019-01-31

申请号：US16043958

申请日：2018-07-24

Applicant: HITACHI, LTD.

Inventor： Thantip KRASIENAPIBAL ,  Yasuhiro SHIRASAKI ,  Momoyo ENYAMA ,  Sayaka KURATA

IPC: H01J37/22 ,  G06K9/32 ,  G06K9/46 ,  H01J37/20 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/222 ,  G06K9/0014 ,  G06K9/3233 ,  G06K9/4661 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01J2237/20235 ,  H01J2237/2804 ,  H01J2237/2806 ,  H01J2237/2813 ,  H01J2237/282

Abstract: In this invention, information of material composition, process conditions and candidates of crystal structure either known or imported from material database is used to determine sample stage tilt angle and working distance (WD). Under these determined tilt angle and WD, the intensity of the electrons emitted at different angles and with different energies is measured using a scanning electron microscope (SEM) system comprising: a use of materials database containing materials composition, formation process, crystal structure and its electron yield; a sample stage that is able to move, rotate and tilt; an processing section for calculating optimum working distance for an observation from material database and measurement condition; means for acquiring an image of crystal information of a desired area of a sample based on an image obtained from SEM observation.

公开(公告)号：US20180232869A1

公开(公告)日：2018-08-16

申请号：US15894605

申请日：2018-02-12

Applicant: HITACHI, LTD.

Inventor： Momoyo ENYAMA ,  Yasuhiro SHIRASAKI ,  Michio HATANO ,  Makoto SAKAKIBARA

IPC: G06T5/50 ,  G06T1/00 ,  G06T5/00

Abstract: An image forming apparatus includes an observation image input section in which a plurality of observation images is input, an emphasis information input section that inputs information to be emphasized, a storage section that defines a plurality of conversion functions that converts the plurality of observation images into a converted image on the basis of a function for conversion and takes, as a parameter, a gradation value of each pixel in the plurality of observation images and a plurality of emphasis functions that takes, as a parameter, a gradation value of each pixel in the conversion functions, an image calculation section that calculates an image in which information to be emphasized is emphasized on the basis of the plurality of input observation images, the input information of the information to be emphasized, the conversion functions, and the emphasis functions, and an emphasized image output section that outputs the emphasized image.

公开(公告)号：US20210407763A1

公开(公告)日：2021-12-30

申请号：US17279039

申请日：2019-08-09

Applicant: Hitachi, Ltd.

Inventor： Takafumi MIWA ,  Hirokazu TAMAKI ,  Momoyo ENYAMA ,  Makoto SAKAKIBARA ,  Sayaka KURATA ,  Atsuko SHINTANI ,  Takashi DOBASHI ,  Kotoko URANO ,  Akiko KAGATSUME ,  Minseok PARK ,  Yasuhiro SHIRASAKI ,  Thantip KRASIENAPIBAL

IPC: H01J37/26 ,  H01J37/28 ,  H01J37/22

Abstract: A measurement system comprising: a measurement apparatus observing a sample based on an observation condition including parameters; and an observation condition database storing data in which a search key related to the sample and the observation condition, a control unit calculating information on an observation condition of a sample is configured to: receive an observation condition search request including a search key related to a target sample; refer the observation condition database to search for the first data matching or similar to the search key related to the target sample included in the observation condition search request, calculate, based on the searched first data, a candidate observation condition of the measurement apparatus for observing the target sample, and output display data for presenting the candidate observation condition.

公开(公告)号：US20200257937A1

公开(公告)日：2020-08-13

申请号：US16712568

申请日：2019-12-12

Applicant: HITACHI, LTD.

Inventor： Thantip KRASIENAPIBAL ,  Sayaka KURATA ,  Momoyo ENYAMA ,  Yasuhiro SHIRASAKI

IPC: G06K9/62 ,  G06K9/44 ,  G06N20/00

Abstract: An information processing system creates a teacher database configured to train an analysis model from an observation image and labeling information corresponding to the observation image using an information processor. This system includes a storage unit, an image processing unit, and a teacher database creating unit. The storage unit stores image processing data formed of information showing a relationship between an observation condition and a parameter relating to the observation image. Further stores a first observation image, a first observation condition, and first labeling information. The image processing unit accepts the first observation image and the first observation condition as inputs, performs image processing corresponding to the parameter to the first observation image based on the image processing data, and creates a second observation image corresponding to a second observation condition. The teacher database creating unit creates the teacher database from the second observation image and the first labeling information.

公开(公告)号：US20190131104A1

公开(公告)日：2019-05-02

申请号：US16089269

申请日：2016-03-31

Applicant: HITACHI, LTD.

Inventor： Yasuhiro SHIRASAKI ,  Momoyo ENYAMA

IPC: H01J37/05 ,  H01J37/147 ,  H01J37/28 ,  H01J37/153

Abstract: A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, includes: an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam; a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein; a correction mechanism that is placed off of a trajectory of the primary charged particle beam but on a trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through; and a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.