公开(公告)号：US20230238290A1

公开(公告)日：2023-07-27

申请号：US18152252

申请日：2023-01-10

Applicant: Hitachi High-Tech Corporation

Inventor： Naoaki KONDO ,  Yuki DOI ,  Atsushi MIYAMOTO ,  Hideki NAKAYAMA ,  Hirohiko KITSUKI

IPC: H01L21/66 ,  G06T7/13 ,  H01J37/28 ,  G01N21/956 ,  G01N21/95

CPC classification number: H01L22/12 ,  G06T7/13 ,  H01J37/28 ,  G01N21/95607 ,  G01N21/9503 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A defect observation method includes, as steps executed by a computer system, a first step of acquiring, as a bevel image, an image captured using defect candidate coordinates in a bevel portion as an imaging position by using a microscope or an imaging apparatus; and a second step of detecting a defect in the bevel image. The second step includes a step of determining whether there is at least one portion among a wafer edge, a wafer notch, and an orientation flat in the bevel image, a step of switching and selectively applying a defect detection scheme of detecting the defect from the bevel image from a plurality of schemes which are candidates based on a determination result, and a step of executing a process of detecting the defect from the bevel image in conformity with the switched scheme.

公开(公告)号：US20230013887A1

公开(公告)日：2023-01-19

申请号：US17864773

申请日：2022-07-14

Applicant: Hitachi High-Tech Corporation

Inventor： Akira ITO ,  Atsushi MIYAMOTO ,  Naoaki KONDO ,  Hideki NAKAYAMA

IPC: G06V10/778 ,  G06T7/00

Abstract: In a learning phase, a processor of a sample observation device: stores design data on a sample in a storage resource; creates a first learning image as a plurality of input images; creates a second learning image as a target image; and learns a model related to image quality conversion with the first and second learning images. In a sample observation phase, the processor obtains, as an observation image, a second captured image output by inputting a first captured image obtained by imaging the sample with an imaging device to the model. The processor creates at least one of the first and second learning images based on the design data.