公开(公告)号：US20220216034A1

公开(公告)日：2022-07-07

申请号：US17603440

申请日：2019-04-23

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Kuniyasu NAKAMURA ,  Hiromi MISE

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/26 ,  H01J37/244

Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.

公开(公告)号：US20220230844A1

公开(公告)日：2022-07-21

申请号：US17608651

申请日：2019-05-23

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Hiromi MISE ,  Shuntaro ITO

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26 ,  H01J37/22

Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.