公开(公告)号：US20240186108A1

公开(公告)日：2024-06-06

申请号：US17773127

申请日：2019-11-22

Applicant: Hitachi High-Tech Corporation

Inventor： Hirokazu TAMAKI ,  Hiromi MISE

IPC: H01J37/26 ,  G01N23/06 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/21

CPC classification number: H01J37/265 ,  G01N23/06 ,  G01N23/2251 ,  H01J37/20 ,  H01J37/21 ,  H01J2237/1534

Abstract: A charged particle beam system includes a charged particle beam apparatus that irradiates, via a charged particle optical system, a sample with a charged particle beam from a charged particle source and a control system that controls the charged particle ray apparatus. The control system evaluates, with respect to a signal obtained by irradiating the sample with the charged particle beam via the charged particle optical system having an astigmatic aberration, a score based on an index that changes in accordance with a spatial spread of the charged particle beam and determines a positional relation between a height position of the sample and a convergence plane of the charged particle beam based on the astigmatic aberration of the charged particle optical system and a result of the evaluation.

公开(公告)号：US20220230844A1

公开(公告)日：2022-07-21

申请号：US17608651

申请日：2019-05-23

Applicant: Hitachi High-Tech Corporation

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Hiromi MISE ,  Shuntaro ITO

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/20 ,  H01J37/26 ,  H01J37/22

Abstract: A charged particle beam apparatus includes a movement mechanism, a particle source, an optical element, a detector, and a control mechanism configured to control, based on an observation condition, the movement mechanism, the particle source, the optical element, and the detector. The control mechanism is configured to acquire a diffraction pattern image including a plurality of Kikuchi lines as a comparison image after inclining the movement mechanism by a first angle, evaluate an error between an inclination angle of the sample and a target inclination angle using a reference image of a reference diffraction pattern and the comparison image, and control inclination of the movement mechanism based on an evaluation result.

公开(公告)号：US20210190703A1

公开(公告)日：2021-06-24

申请号：US17053296

申请日：2018-05-15

Applicant: Hitachi High-Tech Corporation

Inventor： Tsunenori NOMAGUCHI ,  Hiromi MISE

IPC: G01N23/04 ,  H01J37/26 ,  H01J37/244 ,  H01J37/20 ,  G01N23/06

Abstract: To provide, in observation of a sample that requires a movement between various devices, a charged particle beam device, a method for processing the sample, and an observation method which facilitate the movement between the devices. The charged particle beam device that processes an observation target on the sample using a charged particle beam includes: a sample stage on which the sample is placed; an observation unit configured to observe the observation target; and a writing unit configured to write information of the observation target in a writing position of the sample.

公开(公告)号：US20220244201A1

公开(公告)日：2022-08-04

申请号：US17594658

申请日：2019-04-26

Applicant: Hitachi High-Tech Corporation

Inventor： Toshie YAGUCHI ,  Keiji TAMURA ,  Hiromi MISE ,  Yasuyuki NODERA ,  Akiko WAKUI ,  Keisuke IGARASHI

IPC: G01N23/2251 ,  H01J37/26 ,  H01J37/28 ,  H01J37/04

Abstract: Provided is a transmission electron microscope capable of obtaining a hollow-cone dark-field image and visually displaying irradiation conditions thereof. The transmission electron microscope is provided with an irradiation unit for irradiating a specimen with an electron beam, an objective lens for causing the electron beam transmitted through the specimen to form an image, beam deflectors for deflecting the electron beam, said beam deflectors being positioned higher than a position where the specimen is to be placed, an objective movable aperture for passing only a portion of the electron beam transmitted through the specimen, and a deflection coil control unit. The deflection coil control unit controls a deflection angle of the electron beam using the beam deflectors such that the specimen is irradiated with the electron beam at a predetermined angle with respect to an optical axis while the electron beam is moving in a precessional manner and such that only a diffracted wave and/or a scattered wave having a desired angle among diffracted waves and/or scattered waves generated when the electron beam is transmitted through the specimen passes through the objective movable aperture.

公开(公告)号：US20220216034A1

公开(公告)日：2022-07-07

申请号：US17603440

申请日：2019-04-23

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Takashi DOBASHI ,  Hirokazu TAMAKI ,  Kuniyasu NAKAMURA ,  Hiromi MISE

IPC: H01J37/28 ,  H01J37/20 ,  H01J37/26 ,  H01J37/244

Abstract: A charged particle beam apparatus includes: a movement mechanism; a particle source; an optical element; a detector; and a control mechanism, in which the control mechanism acquires a diffraction pattern including a plurality of Kikuchi lines, calculates a crystal zone axis of the sample by performing analysis based on a plurality of intersections at which two Kikuchi lines included in the diffraction pattern intersect with each other, calculates an inclination angle of the sample based on the crystal zone axis and an irradiation direction of the charged particle beam, and controls the moving mechanism based on the inclination angle.

公开(公告)号：US20230377836A1

公开(公告)日：2023-11-23

申请号：US18027501

申请日：2020-09-28

Applicant: Hitachi High-Tech Corporation

Inventor： Azusa KONNO ,  Takashi SHIDARA ,  Ichiro FUJIMURA ,  Daiji KIRIHATA ,  Hiromi MISE

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/222 ,  H01J37/244 ,  H01J2237/24578 ,  H01J2237/2448

Abstract: Depth information of a multilayer structure is acquired quickly and with high accuracy. An analysis system includes (a) acquiring a first captured image of a sample SAM viewed from a first direction by irradiating the sample SAM including a multilayer structure with an electron beam EB1 from the first direction, (b) acquiring a second captured image of the sample SAM viewed from a second direction by irradiating the sample SAM with the electron beam EB1 from the second direction, in which the second direction intersects the first direction, (c) acquiring depth information of the multilayer structure using information of the sample SAM including the first captured image, the second captured image, a number of layers of the multilayer structure, a thickness of one layer or a thickness of each layer of the multilayer structure, and a depth at which a first layer of the multilayer structure starts.

公开(公告)号：US20220230840A1

公开(公告)日：2022-07-21

申请号：US17595807

申请日：2019-05-29

Applicant: Hitachi High-Tech Corporation

Inventor： Shuntaro ITO ,  Hiromi MISE

IPC: H01J37/24

Abstract: A charged particle beam device includes a charged particle beam device main body, a computer configured to control the charged particle beam device main body, including a CPU and a DRAM, and including software for controlling the charged particle beam device main body, a monitoring unit configured to monitor a resource usage status in the computer, an allocation availability determination unit configured to determine whether or not a resource for executing processing required by the software is allocatable in the computer according to a monitoring result of the monitoring unit, and a notification unit configured to notify, when the determination of the allocation availability determination unit is negative, information indicating that the determination is negative.