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公开(公告)号:US20200173039A1
公开(公告)日:2020-06-04
申请号:US16205341
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Yu-Ming Lin , Wen-Hsuan Chao , Chiu-Ping Huang , Pin-Hsin Yang , Hsiao-Chun Huang , Jiunn-Nan Lin
Abstract: A method for hydrogen evolution by electrolysis includes soaking a membrane electrode assembly into an alkaline aqueous solution. The membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and a cationic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer, the second catalyst layer, or both of the above has a chemical structure of MxRuyN2, wherein M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, 0
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公开(公告)号:US12077873B2
公开(公告)日:2024-09-03
申请号:US17107034
申请日:2020-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Wen-Hsuan Chao , Chiu-Ping Huang , Pin-Hsin Yang , Hsiao-Chun Huang , Jiunn-Nan Lin , Yu-Ming Lin
IPC: C25B11/075 , C01B21/06 , C25B1/04 , C25B9/73 , C25B11/051 , C25B11/057 , C30B25/06 , C30B29/38
CPC classification number: C25B11/075 , C01B21/0615 , C01B21/0622 , C25B1/04 , C25B9/73 , C25B11/051 , C25B11/057 , C30B25/06 , C30B29/38 , C01P2002/02 , C01P2002/76
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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公开(公告)号:US10914012B2
公开(公告)日:2021-02-09
申请号:US16205903
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Yu-Ming Lin , Wen-Hsuan Chao , Chiu-Ping Huang , Pin-Hsin Yang , Hsiao-Chun Huang , Jiunn-Nan Lin
Abstract: A membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and an anionic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer has a chemical structure of M′aM″bN2 or M′cM″dCe, wherein M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, M″ is Nb, Ta, or a combination thereof, 0.7≤a≤1.7, 0.3≤b≤1.3, a+b=2, 0.24≤c≤1.7, 0.3≤d≤1.76, and 0.38≤e≤3.61, wherein M′aM″bN2 is a cubic crystal system and M′cM″d Ce is a cubic crystal system or amorphous.
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公开(公告)号:US10914011B2
公开(公告)日:2021-02-09
申请号:US16205341
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Yu-Ming Lin , Wen-Hsuan Chao , Chiu-Ping Huang , Pin-Hsin Yang , Hsiao-Chun Huang , Jiunn-Nan Lin
Abstract: A method for hydrogen evolution by electrolysis includes soaking a membrane electrode assembly into an alkaline aqueous solution. The membrane electrode assembly includes an anode having a first catalyst layer on a first gas-liquid diffusion layer, a cathode having a second catalyst layer on a second gas-liquid diffusion layer, and a cationic exchange membrane between the first catalyst layer of the anode and the second catalyst layer of the cathode. The first catalyst layer, the second catalyst layer, or both of the above has a chemical structure of MxRuyN2, wherein M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, 0
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公开(公告)号:US11142836B2
公开(公告)日:2021-10-12
申请号:US16204905
申请日:2018-11-29
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Wen-Hsuan Chao , Yu-Ming Lin , Pin-Hsin Yang , Hsiao-Chun Huang , Chiu-Ping Huang , Jiunn-Nan Lin
IPC: C25B11/075 , C01B21/06 , C23C14/06 , C25B1/04 , C23C14/34 , C01B32/907
Abstract: A method for manufacturing catalyst material is provided, which includes putting an M′ target and an M″ target into a nitrogen-containing atmosphere, in which M′ is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn, and M″ is Nb, Ta, or a combination thereof. Powers are provided to the M′ target and the M″ target, respectively. Providing ions to bombard the M′ target and the M″ target to sputtering deposit M′aM″bN2 on a substrate, wherein 0.7≤a≤1.7, 0.3≤b≤1.3, and a+b=2, wherein M′aM″bN2 is a cubic crystal system.
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公开(公告)号:US11549188B2
公开(公告)日:2023-01-10
申请号:US17243303
申请日:2021-04-28
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Hsiao-Chun Huang , Li-Duan Tsai , Hao-Ming Chen
IPC: C25B11/052 , C25B1/04 , C25B11/031 , C25B9/19
Abstract: A membrane electrode assembly includes a first electrode, a second electrode, and an anion exchange membrane disposed between the first electrode and the second electrode. The first electrode includes a first metal mesh, a first catalyst layer wrapping the first metal mesh, a second metal mesh, and a second catalyst layer wrapping the second metal mesh. The first metal mesh is disposed between the anion exchange membrane and the second metal mesh. The second metal mesh is thicker than the first metal mesh, and the first catalyst layer is thicker than the second catalyst layer. The second catalyst layer is iron, cobalt, manganese, zinc, niobium, molybdenum, ruthenium, platinum, gold, or aluminum. The second catalyst layer is crystalline.
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公开(公告)号:US10900133B2
公开(公告)日:2021-01-26
申请号:US16205349
申请日:2018-11-30
Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
Inventor: Kuo-Hsin Lin , Li-Duan Tsai , Wen-Hsuan Chao , Chiu-Ping Huang , Pin-Hsin Yang , Hsiao-Chun Huang , Jiunn-Nan Lin , Yu-Ming Lin
Abstract: A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MxRuyN2 on a substrate by sputtering, wherein 0
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